申请人:Hoechst Aktiengesellschaft
公开号:US04849524A1
公开(公告)日:1989-07-18
The invention relates to a process for preparing compounds of the formula I ##STR1## in which R stands for hydrogen, alkyl or aralkyl and R.sup.1 to R.sup.5 are identical or different radicals, (substituted) alkyl, cycloalkyl or (substituted) aryl or in which the pairs of radicals R.sup.1 and R.sup.2, R.sup.2 and R.sup.3, and R.sup.4 and R.sup.5 together with the carbon atom(s) supporting them form a mono- or bicyclic ring system and the other radicals are hydrogen, by treating a compound of the formula II ##STR2## in which R and R.sup.1 and R.sup.5 have the abovementioned meaning and R.sup.6 and R.sup.7 denote alkyl or aralkyl or together with the nitrogen atom supporting them form a heterocycle which can additionally contain an oxygen atom, with a reducing agent.
本发明涉及一种制备式I的化合物的过程:##STR1##
其中,R表示氢、烷基或芳基烷基,R1至R5是相同或不同的基团,(取代)烷基、环烷基或(取代)芳基,或者其中基团R1和R2、R2和R3,以及R4和R5与支持它们的碳原子一起形成单环或双环环系统,而其他基团为氢。该过程通过用还原剂处理式II的化合物实现:##STR2##
其中,R和R1和R5具有上述含义,而R6和R7表示烷基或芳基烷基,或者与支持它们的氮原子一起形成一个杂环,该杂环可以额外包含一个氧原子。