NEGATIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND METHOD FOR PATTERNING USING THE SAME
申请人:Maeda Katsumi
公开号:US20110281217A1
公开(公告)日:2011-11-17
This invention relates to a negative photosensitive insulating resin composition characterized in that the composition comprises an alkali-soluble polymer having at least one repeating constitutional unit represented by the following general formula (1), a cross-linker and a photo-acid generator. The negative photosensitive insulating resin composition provides a film having excellent properties such as heat resistance, mechanical properties and electric properties, and can be alkali-developed to achieve high resolution.
(In the formula, R
1
represents a hydrogen atom or a methyl group, and R
2
to R
5
represent, independently each other, a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms.)