RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
申请人:Kawaue Akiya
公开号:US20120301829A1
公开(公告)日:2012-11-29
A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO
2
— bond or an —O—SO
2
— bond, and at least one carbon atom which is not adjacent to the —SO
2
— bond or the —O—SO
2
— bond has an oxygen atom as a substituent; Q
1
represents a divalent linking group or a single bond; Y
1
represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A
+
represents an organic cation].
[Chemical Formula 1]
X-Q
1
-Y
1
—SO
3
⊖
A
⊕
(b1-1)
一种抗蚀组合物,包括基础组分(A)和酸发生剂组分(B)。在酸的作用下,基础组分(A)在显影液中表现出改变的溶解度,酸发生剂组分(B)在暴露后生成酸。酸发生剂组分(B)包括一个酸发生剂(B1),该酸发生剂由下式(b1-1)所表示的化合物组成[其中,X表示一个具有3至30个碳原子的环状基团,可能具有取代基,但是环状基团的骨架中含有—SO2—键或—O—SO2—键,并且至少有一个不邻接于—SO2—键或—O—SO2—键的碳原子具有氧原子作为取代基;Q1表示一个二价连接基团或一个单键;Y1表示一个可以具有取代基的烷基基团或者可以具有取代基的氟代烷基基团;A+表示一个有机阳离子]。[化学式1] X-Q1-Y1—SO3⊖A⊕(b1-1)