(R(R*,R*))-(+)-2,2'-(isopropylidenebis(4-benzyl-2-oxazoline)

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (R(R*,R*))-(+)-2,2'-(isopropylidenebis(4-benzyl-2-oxazoline)
• 英文别名: 4-benzyl-2-[2-(4-benzyl-4,5-dihydro-1,3-oxazol-2-yl)propan-2-yl]-4,5-dihydro-1,3-oxazole
• 化学式: C₂₃H₂₆N₂O₂
• 分子量: 362.5
• InChiKey: GAKCKAKYRQUVRK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.4
• 重原子数：
  27
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.39
• 拓扑面积：
  43.2
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210286266A1

  公开（公告）日：2021-09-16

  The present invention is a material for forming an organic film, including: a compound shown by the following general formula (1); and an organic solvent, where in the general formula (1), X represents an organic group with a valency of “n” having 2 to 50 carbon atoms or an oxygen atom, “n” represents an integer of 1 to 10 , and R 1 independently represents any of the following general formulae (2), where in the general formulae (2), broken lines represent attachment points to X, and Q 1 represents a monovalent organic group containing a carbonyl group, at least a part of which is a group shown by the following general formulae (3), where in the general formulae (3), broken lines represent attachment points, X 1 represents a single bond or a divalent organic group having 1 to 20 carbon atoms optionally having a substituent when the organic group has an aromatic ring, R 2 represents a hydrogen atom, a methyl group, an ethyl group, or a phenyl group, and ** represents an attachment point. An object of the present invention is to provide a material for forming an organic film for forming an organic film having dry etching resistance, and also having high filling and planarizing properties and adhesion to a substrate.

  本发明是一种用于形成有机薄膜的材料，包括：由以下通用式（1）所示的化合物；和有机溶剂，在通用式（1）中，X代表具有2至50个碳原子或一个氧原子的价为“n”的有机基团，“n”表示1到10的整数，R1独立地表示以下通用式（2）中的任何一种，其中在通用式（2）中，虚线表示连接点到X，Q1表示含有羰基的一价有机基团，其中至少部分是以下通用式（3）所示的基团，其中在通用式（3）中，虚线表示连接点，X1表示单键或具有1到20个碳原子的二价有机基团，在有机基团具有芳香环时可选地具有取代基，R2表示氢原子、甲基基团、乙基基团或苯基团，**表示连接点。本发明的目的是提供一种用于形成具有干法刻蚀抗性的有机薄膜的材料，同时具有高填充和平整化性能以及对基底的粘附性。
• SUBSTITUTED AMIDE COMPOUND
  申请人：Kawaminami Eiji

  公开号：US20120184521A1

  公开（公告）日：2012-07-19

  A substituted amide compound is useful as an active ingredient of a pharmaceutical composition, in particular a pharmaceutical composition for treating diseases caused by lysophosphatidic acid (LPA). The compound is of a formula: In this formula, A is an optionally substituted aryl, etc.; B is an optionally substituted 5-membered aromatic hetero ring group; X is a single bond or —(CR X1 R X2 ) n —; n is 1, 2, 3, or 4; R X1 and R X2 are hydrogen, etc.; Y 1 to Y 5 are each CR Y or N; each R Y is hydrogen, etc.; R 1 and R 2 are hydrogen, etc.; m is 1, 2, or 3; R 3 is hydrogen, etc.; and R 4 is an optionally substituted lower alkyl, etc.

  一种替代酰胺化合物作为药物组合物的活性成分是有用的，特别是用于治疗由溶血磷脂酸（LPA）引起的疾病的药物组合物。该化合物的化学式如下： 在这个化学式中，A是可选地取代的芳基等；B是可选地取代的5-成员芳香杂环基团；X是单键或—(CR X1 R X2 ) n —；n为1、2、3或4；R X1 和R X2 为氢等；Y 1 到Y 5 分别为CR Y 或N；每个R Y 为氢等；R 1 和R 2 为氢等；m为1、2或3；R 3 为氢等；R 4 为可选地取代的低碳烷基等。
• [EN] METHOD FOR PRODUCING AN OPTICALLY ACTIVE NITRO COMPOUND<br/>[FR] PROCEDE DE PRODUCTION D'UN COMPOSE NITRO OPTIQUEMENT ACTIF
  申请人：CARREIRA ERICK M

  公开号：WO2004103951A1

  公开（公告）日：2004-12-02

  An optically active nitro compound having two hydrogen atoms on its α-cabon atom and having β-asymmetric carbon atom can be produced by making α, β-unsaturated nitroolefin having a hydrogen atom on its α-cabon atom react with at least two organosilicon compounds having at lest one silicon-hydrogen bond in the molecule in the presence of an asymmetric copper complex, or react with an organosilicon compound having at least one silicon-hydrogen bond in the molecule in the presence of an asymmetric copper complex and water.

  具有两个氢原子的α-碳原子和β-手性碳原子的光学活性硝基化合物可以通过使具有α-碳原子上的氢原子的α，β-不饱和硝基烯烃与至少两个分子中至少有一个硅-氢键的有机硅化合物在存在不对称铜配合物的情况下反应，或者在存在不对称铜配合物和水的情况下，使具有至少一个硅-氢键的有机硅化合物与α-碳原子上的氢原子反应来制备。
• COMPOUND, COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190300498A1

  公开（公告）日：2019-10-03

  A compound including two or more partial structures shown by the following general formula (1-1) in the molecule, wherein each Ar independently represents an aromatic ring optionally having a substituent or an aromatic ring that contains at least one nitrogen atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with an organic group; B represents an anionic leaving group that is capable of forming a reactive cation due to effect of either or both of heat and acid. This provides a compound that is capable of curing under the film forming conditions in air or an inert gas without forming byproducts, and forming an organic under layer film that has good dry etching durability during substrate processing not only excellent characteristics of gap filling and planarizing a pattern formed on a substrate.

  该化合物包括分子中由以下一般式（1-1）所示的两个或更多个部分结构，其中每个Ar独立地表示一个芳香环，可以具有取代基，或者是一个含有至少一个氮原子的芳香环，可以具有取代基，两个Ar可以选择地彼此连接以形成一个环结构；虚线代表与有机基团的键合；B代表一种能够由于热和酸的作用而形成反应性阳离子的阴离子离去基团。这提供了一种能够在空气或惰性气体中的成膜条件下固化而不形成副产物的化合物，并形成具有良好干法刻蚀耐久性的有机底层膜，在衬底加工过程中不仅具有填隙和平坦化在衬底上形成的图案的优异特性。
• RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180284615A1

  公开（公告）日：2018-10-04

  Provided is a resist underlayer film composition which is excellent in resistance to a basic hydrogen peroxide aqueous solution, in gap-filling and planarization characteristics, and in dry etching characteristic, wherein the resist underlayer film composition is used for a multilayer resist method, comprising: (A1) a polymer (1A) comprising one, or two or more, of a repeating unit represented by following general formula (1); (A2) one, or two or more, of a polyphenol compound having a formula weight of 2,000 or less and not having a 3,4-dihydroxy phenyl group; and (B) an organic solvent.

  提供了一种抗碱性过氧化氢水溶液、填孔和平坦化特性以及干法蚀刻特性优异的抗蚀底层膜组合物，该抗蚀底层膜组合物用于多层光刻方法，包括：（A1）聚合物（1A），其包括由以下通式（1）表示的重复单元中的一个或两个或多个；（A2）一种或两种或多种分子量不超过2000且不具有3,4-二羟基苯基的多酚化合物；和（B）有机溶剂。