N,N,N',N'-Tetrakis-oxiranylmethyl-hexane-1,6-diamine | 30569-33-6

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N,N,N',N'-Tetrakis-oxiranylmethyl-hexane-1,6-diamine
• 英文别名: N~1~,N~1~,N~6~,N~6~-Tetrakis[(oxiran-2-yl)methyl]hexane-1,6-diamine；N,N,N',N'-tetrakis(oxiran-2-ylmethyl)hexane-1,6-diamine
• CAS: 30569-33-6
• 化学式: C₁₈H₃₂N₂O₄
• 分子量: 340.463
• InChiKey: DBFNPLIIFLYPTH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  24
• 可旋转键数：
  15
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  56.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  N,N,N',N'-Tetrakis-oxiranylmethyl-hexane-1,6-diamine 在 水 作用下， 生成 3-[{6-[Bis-(2,3-dihydroxy-propyl)-amino]-hexyl}-(2,3-dihydroxy-propyl)-amino]-propane-1,2-diol
  参考文献：
  名称：

  Chezlov, I. G.; Zavlin, P. M.; Kuznetsov, L. L., Russian Journal of Applied Chemistry, 1998, vol. 71, # 1, p. 155 - 161

  摘要：

  DOI：
• 作为产物：
  描述：

  1,6-己二胺 、 环氧氯丙烷 以78%的产率得到N,N,N',N'-Tetrakis-oxiranylmethyl-hexane-1,6-diamine
  参考文献：
  名称：

  Chezlov, I. G.; Zavlin, P. M.; Kuznetsov, L. L., Russian Journal of Applied Chemistry, 1998, vol. 71, # 1, p. 155 - 161

  摘要：

  DOI：

文献信息

• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180120702A1

  公开（公告）日：2018-05-03

  The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.

  本发明提供了一种四羧酸二酯化合物，其表示为以下通式（1）：其中，X1表示四价有机基团，R1表示以下通式（2）所表示的基团：其中，虚线表示键合，Y1表示具有k+1价的有机基团，Rs表示含有至少一个硅原子的基团，“k”表示1、2或3，“n”表示0或1。可以提供一种四羧酸二酯化合物，该化合物能够引导聚合物的形成，该聚合物是由使用负光敏树脂组合物的基树脂制成的，该组合物能够形成细微图案并具有高分辨率，使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。
• Polyether, active-hydrogen ingredient , resin-forming composition, and process for producing foam
  申请人：——

  公开号：US20030100623A1

  公开（公告）日：2003-05-29

  The present invention relates to polyether compounds, active hydrogen compounds and resin-forming compositions composed of the polyols, and methods for producing foams by employing the active hydrogen components. These polyether compounds have a decreased number of moles of added EO thereby maintaining the hydrophobicity and have sufficient reactivity as polyol components of resins, thereby having high reaction rates. Therefore, it is possible to provide resins having excellent resin properties (tensile strength, flexural strength, water-absorption swelling ratio, etc.).

  本发明涉及聚醚化合物、活性氢化合物和由聚醚醇组成的树脂成型组合物，以及通过使用活性氢成分制备泡沫的方法。这些聚醚化合物具有降低的EO加入摩尔数，从而保持疏水性，并具有足够的反应性作为树脂的聚醇组分，因此具有高反应速率。因此，可以提供具有优异树脂性能（拉伸强度、弯曲强度、吸水膨胀率等）的树脂。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160200877A1

  公开（公告）日：2016-07-14

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.

  本发明提供了一种含有硅骨架的聚合物化合物，其含有由通式（1）所示的重复单元。可以提供一种适用于化学增强负型光阻组合物的基础树脂的含有硅骨架的聚合物化合物，可以解决在金属布线（如Cu和Al）、电极和基板（特别是在SiN基板上）上产生的剥离问题，并且可以在图案底部和基板上不产生污点和足底轮廓的情况下形成细小的图案。
• SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160033865A1

  公开（公告）日：2016-02-04

  A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.

  提供一种硅结构承载聚合物，包括由双(4-羟基-3-烯丙基苯基)衍生物衍生的重复单元，并具有3,000-500,000的分子量。该聚合物用于化学增感负型光阻组成，克服了涂层从铜或铝的金属线路、电极和SiN基底剥离的问题。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160097973A1

  公开（公告）日：2016-04-07

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.

  本发明提供了一种含有硅骨架的聚合物化合物，其包含由通式（1）所示的重复单元，并具有3,000至500,000的重均分子量。可以提供一种适用于化学增强负型光阻组合物的基础树脂的硅骨架聚合物化合物，该组合物可以纠正在金属线路（如Cu和Al）、电极和基板（尤其是在SiN基板上）上产生的剥离问题，并且可以在使用广泛使用的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上不生成污染物和足型轮廓的情况下形成细小的图案。