N-(2-羟基乙基)-3-甲氧基-丙酰胺 | 35544-45-7

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: N-(2-羟基乙基)-3-甲氧基-丙酰胺
• 英文名称: 3-methoxy-propionic acid-(2-hydroxy-ethylamide)
• 英文别名: 3-Methoxy-propionsaeure-(2-hydroxy-aethylamid)；Propanamide, N-(2-hydroxyethyl)-3-methoxy-；N-(2-hydroxyethyl)-3-methoxypropanamide
• CAS: 35544-45-7
• 化学式: C₆H₁₃NO₃
• 分子量: 147.174
• InChiKey: OUBLOFZFNZSRQY-UHFFFAOYSA-N

物化性质

• 沸点：
  140-145 °C
• 密度：
  1.071±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -1.4
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  58.6
• 氢给体数：
  2
• 氢受体数：
  3

安全信息

• 海关编码：
  2924199090

反应信息

• 作为产物：
  描述：

  3-甲氧基丙腈 、 C.I.酸性橙108 在 硫化氢 、 水 作用下， 生成 N-(2-羟基乙基)-3-甲氧基-丙酰胺
  参考文献：
  名称：

  US2820801

  摘要：

  公开号：

文献信息

• [EN] 2 -ARYLAMINOQUINAZOLINES FOR TREATING PROLIFERATIVE DISEASES<br/>[FR] 2 -ARYLAMINOQUINAZOLINES DESTINÉES AU TRAITEMENT DES MALADIES PROLIFÉRATIVES
  申请人：NOVARTIS AG

  公开号：WO2009153313A1

  公开（公告）日：2009-12-23

  The invention provides novel compounds that are inhibitors of PDKI. Also provided are pharmaceutical compositions including the compounds, and methods of treating proliferative diseases, such as cancers, with the compounds or composition.

  这项发明提供了一种抑制PDKI的新型化合物。还提供了包括这些化合物的药物组合物，以及使用这些化合物或组合物治疗增殖性疾病，如癌症的方法。
• Quinazoline Derivatives as a Multiplex Inhibitor and Method For the Preparation Thereof
  申请人：Ahn Young-Gil

  公开号：US20080318950A1

  公开（公告）日：2008-12-25

  The present invention relates to a novel quinazoline derivative and a pharmaceutically acceptable salt thereof as a multiplex inhibitor, a method for the preparation thereof, and a pharmaceutical composition and a therapeutic composition comprising same as an active ingredient. The inventive quinazoline derivative as a multiplex inhibitor can selectively and effectively inhibit diseases caused by the overactivity of a tyrosine kinase.

  本发明涉及一种新型喹唑啉衍生物及其药学上可接受的盐，作为多重抑制剂，其制备方法，以及包含其作为活性成分的药物组合物和治疗组合物。发明的喹唑啉衍生物作为多重抑制剂可以选择性和有效地抑制由酪氨酸激酶过度活性引起的疾病。
• Novel compounds for treating proliferative diseases
  申请人：Jain Rama

  公开号：US20100121052A1

  公开（公告）日：2010-05-13

  The invention provides novel compounds that are inhibitors of PDK1. Also provided are pharmaceutical compositions including the compounds, and methods of treating proliferative diseases, such as cancers, with the compounds or compositions.

  本发明提供了一些新的化合物，这些化合物是PDK1的抑制剂。同时提供了包括这些化合物的药物组合物，以及使用这些化合物或组合物治疗增生性疾病（如癌症）的方法。
• Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same
  申请人：——

  公开号：US20010049346A1

  公开（公告）日：2001-12-06

  A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resist removing agent includes alkoxy N-hydroxyalkyl alkanamide. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, and at least one compound selected from a group consisting of a polar material having a dipole moment of 3 or greater, an attack inhibitor and alkanolamine. A substrate having the resist thereon is brought into contact with the resist removing agent or resist removing composition to remove the resist.

  一种抗蚀剂去除剂和一种抗蚀剂去除组合物，具有极佳的去除抗蚀剂和聚合物的能力，并且不会侵蚀底层。抗蚀剂包括烷氧基 N-羟基烷酰胺。抗蚀剂去除组合物包括烷氧基 N-羟基烷酰胺，以及至少一种选自偶极矩为 3 或更大的极性材料、侵蚀抑制剂和烷醇胺的化合物。将含有抗蚀剂的基底与抗蚀剂去除剂或抗蚀剂去除组合物接触，以去除抗蚀剂。
• Composition for stripping photoresist and method of preparing the same
  申请人：——

  公开号：US20040063595A1

  公开（公告）日：2004-04-01

  A composition for stripping photoresist, methods of preparing and forming the same, a method of manufacturing a semiconductor device using the composition, and a method of removing a photoresist pattern from an underlying layer using the composition, where the composition may include an ethoxy N-hydroxyalkyl alkanamide represented by the formula, CH 3 CH 2 —O—R 3 —CO—N—R 1 R 2 OH, an alkanolamine and a polar material. Raw materials of alkyl alkoxy alkanoate, represented by a chemical formula of R 4 —O—R 3 —COOR 5 , and alkanolamine, represented by a chemical formula of NHR 1 R 2 OH, may be mixed to form a mixture, which is stirred and cooled to obtain the composition. The composition may balance exfoliation and dissolution of photoresist patterns, and may potentially eliminate thread-type residues from remaining on a surface of an underlying layer after removing the photoresist patterns.

  一种用于剥离光刻胶的组合物，制备和形成该组合物的方法，使用该组合物制造半导体器件的方法，以及使用该组合物从底层去除光刻胶图案的方法，其中该组合物可包括由式 CH 代表的乙氧基 N-羟基烷基酰胺，CH 3 CH 2 -O-R 3 -CO-N-R 1 R 2 OH、一种烷醇胺和一种极性物质。烷基烷氧基烷酸酯原料，化学式为 R 4 -O-R 3 -COOR 5 和烷醇胺，化学式为 NHR 1 R 2 OH 表示的烷醇胺混合形成混合物，经搅拌和冷却后得到组合物。该组合物可平衡光刻胶图案的剥离和溶解，并有可能在去除光刻胶图案后消除残留在底层表面的线型残留物。