PHOTORESIST COMPOSITIONS, INTERMEDIATE PRODUCTS, AND METHODS OF MANUFACTURING PATTERNED DEVICES AND SEMICONDUCTOR DEVICES
申请人:SAMSUNG ELECTRONICS CO., LTD.
公开号:US20190179227A1
公开(公告)日:2019-06-13
A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.