申请人:——
公开号:US20010041303A1
公开(公告)日:2001-11-15
Provided is a positive photoresist composition which comprises (A) a resin which contains a repeating unit represented by formula (I) shown below and a repeating unit represented by formula (II) shown below and whose solubility in an alkaline developing solution increases by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or radiation,
1
wherein R
1
, R
2
and R
3
each independently represents an alkyl group, a haloalkyl group, a halogen atom, an alkoxy group, a trialkylsilyl group or a trialkylsilyloxy group; and n represents
0
or
1,
2
wherein M represents an atomic group necessary for forming an alicyclic structure, which may be substituted, together with the connected two carbon atoms (C-C); and R
11
and R
12
each independently represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group which may be substituted.
提供的是一种正光刻胶组合物,其中包括(A)树脂,该树脂包含以下式子(I)和式子(II)所表示的重复单元,并且在酸的作用下其在碱性显影液中的溶解度增加;以及(B)一种化合物,该化合物在被光致辐射照射后会产生酸,其中R1、R2和R3分别独立地表示烷基、卤代烷基、卤素原子、烷氧基、三烷基硅基或三烷基硅氧基;n表示0或1;M表示必要的原子团以形成脂环结构,该原子团可以被取代,与连接的两个碳原子(C-C)一起;R11和R12分别独立地表示氢原子、氰基、卤素原子或可以被取代的烷基。