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N-(4-cyanophenyl)-2-methylbutanamide

中文名称
——
中文别名
——
英文名称
N-(4-cyanophenyl)-2-methylbutanamide
英文别名
——
N-(4-cyanophenyl)-2-methylbutanamide化学式
CAS
——
化学式
C12H14N2O
mdl
——
分子量
202.25
InChiKey
BBVMMBCJNTZYSA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.3
  • 重原子数:
    15
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.33
  • 拓扑面积:
    52.9
  • 氢给体数:
    1
  • 氢受体数:
    2

文献信息

  • HETEROARYL SUBSTITUTED PYRROLO[2,3-b]PYRIDINES AND PYRROLO[2,3-b]PYRIMIDINES AS JANUS KINASE INHIBITORS
    申请人:Rodgers James D.
    公开号:US20100022522A1
    公开(公告)日:2010-01-28
    The present invention provides heteroaryl substituted pyrrolo[2,3-b]pyridines and heteroaryl substituted pyrrolo[2,3-b]pyrimidines that modulate the activity of Janus kinases and are useful in the treatment of diseases related to activity of Janus kinases including, for example, immune-related diseases, skin disorders, myeloid proliferative disorders, cancer, and other diseases.
    本发明提供了杂环芳基取代的吡咯[2,3-b]吡啶和杂环芳基取代的吡咯[2,3-b]嘧啶,其调节Janus激酶的活性,并用于治疗与Janus激酶活性相关的疾病,例如免疫相关疾病、皮肤疾病、髓样增生性疾病、癌症和其他疾病。
  • Heteroaryl Substituted Pyrrolo[2,3-B] Pyridines And Pyrrolo[2,3-B] Pyrimidines As Janus Kinase Inhibitors
    申请人:Incyte Corporation
    公开号:US20140243360A1
    公开(公告)日:2014-08-28
    The present invention provides heteroaryl substituted pyrrolo[2,3-b]pyridines and heteroaryl substituted pyrrolo[2,3-b]pyrimidines that modulate the activity of Janus kinases and are useful in the treatment of diseases related to activity of Janus kinases including, for example, immune-related diseases, skin disorders, myeloid proliferative disorders, cancer, and other diseases.
    本发明提供了杂环取代的吡咯[2,3-b]吡啶和杂环取代的吡咯[2,3-b]嘧啶,这些化合物可以调节Janus激酶的活性,适用于治疗与Janus激酶活性相关的疾病,例如免疫相关疾病、皮肤疾病、髓系增生性疾病、癌症和其他疾病。
  • Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition
    申请人:Nagasaki Hideo
    公开号:US20090155553A1
    公开(公告)日:2009-06-18
    The present invention provides a method of manufacturing capable of readily obtaining a surface metal film material that has excellent adhesiveness of a metal film, reduced variability of adhesion due to humidity changes and excellent heat resistance and flexibility, and a method of manufacturing capable of readily obtaining a patterned metal material excellent in insulation reliability of a region where a patterned metal is not formed, and excellent in heat resistance and flexibility. A method of manufacturing a surface metal film material includes: forming a polymer layer including a polymer that has a cyano group and that chemically bonds directly with a polyimide film, on the polyimide film; imparting a plating catalyst or a precursor thereof to the polymer layer; and performing a plating process on the plating catalyst or the precursor thereof, and a method of manufacturing a patterned metal material including etching a pattern in a plating film of a surface metal film material obtained according to the method of manufacturing a surface metal film material.
  • PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, METHOD OF PRODUCING METAL PLATED MATERIAL, METAL PLATED MATERIAL, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL AND WIRING SUBSTRATE
    申请人:Nagasaki Hideo
    公开号:US20090266583A1
    公开(公告)日:2009-10-29
    The invention provides a photosensitive resin composition comprising: a polymer comprising a polymerizable group and a functional group that interacts with a plating catalyst or a precursor thereof so as to form a coordination bond; and at least one selected from the group consisting of a synthetic rubber, an epoxy acrylate monomer, and a polymerizable monomer having a benzyl alcohol group; a laminate; a method of producing a metal plated material; a metal plated material; a method of producing a metal pattern material; a metal pattern material; and a wiring substrate.
  • LITHOGRAPHIC PRINTING PLATE PRECURSOR, LITHOGRAPHIC PRINTING PLATE PLATEMAKING METHOD, AND POLYMERIZABLE MONOMER
    申请人:Shimono Katsuhiro
    公开号:US20110174179A1
    公开(公告)日:2011-07-21
    There is provided a lithographic printing plate precursor that enables image recording using a laser and that provides an excellent scumming resistance and an excellent developability while maintaining a satisfactory printing durability. Also provided are a platemaking method, and a novel polymerizable monomer. A lithographic printing plate precursor has a support, and an image recording layer disposed thereon and containing a radical polymerization initiator and a polymerizable monomer that has a sulfonamide group and at least two ethylenically unsaturated groups; a lithographic printing plate platemaking method uses this lithographic printing plate precursor; and a polymerizable monomer has a sulfonamide group and at least two ethylenically unsaturated groups.
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