POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATES
申请人:FUJIFILM Corporation
公开号:EP3480658A1
公开(公告)日:2019-05-08
Provided is a positive type photosensitive resin composition including: a polymer compound which contains, in a main chain thereof, a sulfonamide group and a structure represented by Formula A-1; and an infrared absorbent. In Formula A-1, X represents -NR1-, -S-, or -O-, R1 represents a hydrogen atom or an alkyl group, and each symbol "*" independently represents a bonding position with respect to another structure.
本发明提供了一种正型光敏树脂组合物,其中包括:一种聚合物化合物,其主链中含有磺酰胺基团和一种由式 A-1 表示的结构;以及一种红外线吸收剂。在式 A-1 中,X 代表-NR1-、-S-或-O-,R1 代表氢原子或烷基,每个符号 "*"独立地代表相对于另一个结构的键合位置。