POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING POSITIVE PHOTOSENSITIVE DRY FILM, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP3951498A1
公开(公告)日:2022-02-09
The present invention is a positive photosensitive resin composition including: (A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a crosslinkable polymer compound containing a structural unit represented by the following general formula (1) and having a group crosslinked with the component (A); and (C) a compound having a quinonediazide structure for serving as a photosensitizer to generate an acid by light and increase a dissolution speed to an alkaline aqueous solution. An object of the present invention is to provide a positive photosensitive resin composition and a positive photosensitive dry film that enable formation of a fine pattern and high resolution, have excellent mechanical characteristics even when cured at low temperatures, and have no degradation in adhesive force between before and after a high temperature and high humidity test.
本发明是一种正性光敏树脂组合物,包括(A)一种碱溶性树脂,含有至少一种或多种选自聚酰亚胺结构、聚苯并恶唑结构、聚酰胺-酰亚胺结构及其前体结构的结构;(B)一种可交联聚合物化合物,含有由下式(1)表示的结构单元,并具有与组分(A)交联的基团;以及(C)一种具有喹酮噻嗪结构的化合物,用作光敏剂,通过光产生酸,并提高对碱性水溶液的溶解速度。本发明的目的是提供一种正感光树脂组合物和一种正感光干膜,这种组合物和干膜能形成精细的图案和高分辨率,即使在低温下固化也具有优良的机械特性,而且在高温高湿试验前后粘合力不会下降。