nitroso(1H-pyridin-4-ylidene)methanamine

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 英文名称: nitroso(1H-pyridin-4-ylidene)methanamine
• 化学式: C₆H₇N₃O
• 分子量: 137.14
• InChiKey: JEJGOULWKLAJFD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  67.5
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• Pyridine and pyrimidine derivatives as mGIuR2 antagonists
  申请人：McArthur Silvia Gatti

  公开号：US20070232583A1

  公开（公告）日：2007-10-04

  The present invention relates to compounds of formula (I), a process for the manufacture thereof, pharmaceutical compositions containing them, and their use for treating CNS disorders: wherein A, B, X, Y, R 1 , R 2 , R 3 and R 4 are as defined in the description and claims.

  本发明涉及式(I)的化合物，其制造方法，含有它们的药物组合物，以及它们用于治疗中枢神经系统疾病的用途：其中A、B、X、Y、R1、R2、R3和R4如描述和权利要求中所定义。
• FAAH INHIBITORS
  申请人：Sprott Kevin

  公开号：US20090118503A1

  公开（公告）日：2009-05-07

  Indole derivatives that are useful for treating pain, inflammation and other conditions are described. Certain of the compounds are benzyl derivatives and others are benzoyl derivatives. The compounds are substituted at least at the 3 position of the indole.

  本文描述了可用于治疗疼痛、炎症和其他病症的吲哚衍生物。其中某些化合物是苄基衍生物，而其他化合物是苯甲酰基衍生物。这些化合物至少在吲哚的3位被取代。
• PYRIDINE AND PYRIMIDINE DERIVATIVES AS MGLUR 2 ANTAGONISTS
  申请人：Gatti McArthur Silvia

  公开号：US20090318474A1

  公开（公告）日：2009-12-24

  The present invention relates to compounds of formula (I), a process for the manufacture thereof, pharmaceutical compositions containing them, and their use for treating CNS disorders: wherein A, B, X, Y, R 1 , R 2 , R 3 and R 4 are as defined in the description and claims.

  本发明涉及化合物的公式（I），其制造过程，包含它们的药物组合物，以及用于治疗中枢神经系统疾病的方法：其中A、B、X、Y、R1、R2、R3和R4如描述和权利要求所定义。
• USEFUL INDOLE COMPOUNDS
  申请人：Bartolini Wilmin

  公开号：US20090264653A1

  公开（公告）日：2009-10-22

  Indoles that have activity as inhibitors of FAAH are described as are indoles and indole derivatives that have activity as inhibitors of DAO.

  本文描述了具有FAAH抑制剂活性的吲哚化合物，以及具有DAO抑制剂活性的吲哚及其衍生物。
• METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS
  申请人：Lee Wai Mun

  公开号：US20100043823A1

  公开（公告）日：2010-02-25

  The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.

  本发明涉及含有酰胺肟化合物的水性组合物及其清洗半导体衬底上等离子体刻蚀残留物的方法，包括这种稀释的水性溶液。本发明的组合物可以选择性地含有一种或多种其他酸性化合物、一种或多种碱性化合物、含氟化合物和其他成分，如有机溶剂、螯合剂、胺和表面活性剂。本发明还涉及一种在集成电路制造过程中从衬底上去除残留物的方法。