9,10-dimethoxy-1,4-dihydroanthracene | 111078-81-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 9,10-dimethoxy-1,4-dihydroanthracene
• CAS: 111078-81-0
• 化学式: C₁₆H₁₆O₂
• 分子量: 240.302
• InChiKey: GKGQODVOHMVVQJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  9,10-dimethoxy-1,4-dihydroanthracene 在 sodium hydroxide 、 苄基三乙基氯化铵 、 silver trifluoroacetate 作用下， 以 二氯甲烷 、 水 为溶剂， 生成 Trifluoro-acetic acid 8-bromo-5,11-dimethoxy-7,10-dihydro-6H-cyclohepta[b]naphthalen-7-yl ester
  参考文献：
  名称：

  对苯醌和1,4-萘醌稠合的肌钙素的合成及性质

  摘要：

  描述了 8H-cyclohepta[b]naphthalene-5,8,11-trione 和 7H-benzocycloheptene-1,4,7-trione 的首次合成。这些化合物的循环伏安图表明，醌环的退火大大增加了醌的电子亲和力。

  DOI：

  10.1246/cl.1987.669
• 作为产物：
  描述：

  硫酸二甲酯 、 1(1'),4(4'),1a,4a-tetrahydroanthraquinone 、 碘甲烷 在 sodium hydride 作用下， 反应 3.0h， 以75%的产率得到9,10-dimethoxy-1,4-dihydroanthracene
  参考文献：
  名称：

  The structure of the π-molecular complex between 1,4-dihydro-9,10-anthrahydroquinone and 1,4-dihydro-9,10-anthraquinone

  摘要：

  DOI：

  10.1007/bf02576447

文献信息

• RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210397092A1

  公开（公告）日：2021-12-23

  A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH 2 ) p —; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R 01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

  多层光刻法中使用的抗蚀底层膜材料包含以下通式（1）所示的化合物（A）和有机溶剂（B），其中X独立地表示由以下通式（2）所示的一价有机基团；W包含“m”个部分结构，每个部分结构都独立地由以下式（3）所示；“m”和“n”分别表示1到10的整数；断裂的线表示连接臂；Z表示芳香基团；A表示单键或—O—（CH2）p—；“k”表示1到5的整数；“p”表示1到10的整数；R01表示氢原子或具有1到10个碳原子的一价有机基团。该材料能够形成在半导体器件制造过程中通过多层光刻法具有平坦化性能的抗蚀底层膜，以及用于形成抗蚀底层膜的图案化过程和方法。
• KATO NASAHIKO; KASAI MAKIKO; SHIRAKI KANETO; FURUICHI KIMIAKI; MIWA TOSHI+, CHEM. LETT.,(1987) N 4, 669-672
  作者：KATO NASAHIKO、 KASAI MAKIKO、 SHIRAKI KANETO、 FURUICHI KIMIAKI、 MIWA TOSHI+

  DOI：——

  日期：——
• JP2001081116A
  申请人：——

  公开号：JP2001081116A

  公开（公告）日：2001-03-27
• RADICAL POLYMERIZATION CONTROL AGENT AND RADICAL POLYMERIZATION CONTROL METHOD
  申请人：Kawasaki Kasei Chemicals Ltd.

  公开号：US20210122692A1

  公开（公告）日：2021-04-29

  A conventional polymerization inhibitor is for example an agent to scavenge radicals generated during storage of a radical polymerizable compound and used to stably handle the radical polymerizable compound, but is unnecessary when the radical polymerizable compound is to be subjected to radical polymerization reaction, and is preferably removed at the time of the radical polymerization reaction. The object of the present invention is to obviate inconvenience of removing the polymerization inhibitor at the time of radical polymerization. The radical polymerization control agent contained in a radical polymerizable composition of the present invention functions as a radical polymerization inhibitor for example stored in a dark place, but loses its radical polymerization inhibiting effect when polymerization is initiated while being irradiated with light at a certain specific wavelength at the time of polymerization. Thus, radical polymerization of the radical polymerizable compound is easily initiated without increasing the amount of a radical polymerization initiator. That is, the radical polymerization control agent of the present invention is a radical polymerization control agent which is a corn pound having an effect to inhibit radical polymerization of a radical polymerizable compound and which loses the radical polymerization inhibiting effect under irradiation with light rays containing light within a wavelength range of from 300 nm to 500 nm.
• Synthesis and Properties of Tropones Fused with p-Benzoquinone and 1,4-Naphthoquinone
  作者：Masahiko Kato、Makiko Kasai、Kaneto Shiraki、Kimiaki Furuichi、Toshio Miwa

  DOI：10.1246/cl.1987.669

  日期：1987.4.5

  The first synthesis of 8H-cyclohepta[b]naphthalene-5,8,11-trione and 7H-benzocycloheptene-1,4,7-trione are described. The cyclic voltammograms of these compounds showed that the electron affinities of quinones are considerably increased by the annelation of a tropone ring.

  描述了 8H-cyclohepta[b]naphthalene-5,8,11-trione 和 7H-benzocycloheptene-1,4,7-trione 的首次合成。这些化合物的循环伏安图表明，醌环的退火大大增加了醌的电子亲和力。