Polymer, top coating layer, top coating composition and immersion lithography process using the same
申请人:Hata Mitsuhiro
公开号:US20070155925A1
公开(公告)日:2007-07-05
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.