2-naphthylmethyloxytetrafluoroethanesulfonyl fluoride | 1076189-42-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2-naphthylmethyloxytetrafluoroethanesulfonyl fluoride
• 英文别名: 1,1,2,2-Tetrafluoro-2-(naphthalen-2-ylmethoxy)ethanesulfonyl fluoride
• CAS: 1076189-42-8
• 化学式: C₁₃H₉F₅O₃S
• 分子量: 340.271
• InChiKey: GQJVGAZLTGYNFV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  22
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  51.8
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  2-naphthylmethyloxytetrafluoroethanesulfonyl fluoride 在 水 、 lithium hydroxide 作用下， 以 四氢呋喃 为溶剂， 生成 2-naphthylmethyloxytetrafluoroethanesulfonic acid lithium salt
  参考文献：
  名称：

  RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR

  摘要：

  一种抗蚀组合物，包括在酸和酸发生剂组分（B）的作用下，在碱性显影溶液中表现出改变溶解性的基础组分（A），所述酸发生剂组分（B）包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1''）表示的化合物（R1''-R3''表示芳基或烷基，但至少其中一个R1''-R3''表示被(b1-1-0)表示的基团取代的取代芳基，且其中两个R1''-R3''可以相互键合以形成与硫原子形成环的环；X表示C3-C30烃基；Q1表示含有羰基的二价连接基团；X10表示C1-C30烃基；Q3表示单键或二价连接基团；Y10表示—C(═O)—或—SO2—；Y11表示C1-C10烷基或氟代烷基；Q2表示单键或烷基基团；W表示C2-C10烷基基团。

  公开号：

  US20120264061A1

文献信息

• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Hada Hideo

  公开号：US20100119974A1

  公开（公告）日：2010-05-13

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

  一种抗蚀组合物，包括一种基础组分（A），在酸的作用下，在碱性显影液中表现出改变的溶解度，以及一种酸发生剂组分（B），包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1"）表示的化合物（其中，R1"-R3"表示芳基或烷基，但至少有一个R1"-R3"表示被（b1-1-0）表示的基取代的取代芳基，且其中两个R1"-R3"可以相互连接形成一个带有硫原子的环；X表示C3-C30 烃基；Q1表示含有羰基的二价连接基；X10表示C1-C30烃基；Q3表示单键或二价连接基；Y10表示-C（═O）-或-SO2-；表示C1-C10烷基或氟代烷基；Q2表示单键或烷基；W表示C2-C10烷基）。
• NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING A RESIST PATTERN
  申请人：Hada Hideo

  公开号：US20090023095A1

  公开（公告）日：2009-01-22

  There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R 1 represents an aryl group or alkyl group which may contain a substituent group; R 3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R 1 and R 3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R 1 is bonded and the carbon atom with which R 3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R 2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y 1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).
• COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
  申请人：Kawaue Akiya

  公开号：US20100104973A1

  公开（公告）日：2010-04-29

  There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R 2 —CH 2 —O—Y 1 —SO 3 − A + (b1-12) wherein R 2 represents a monovalent aromatic organic group; Y 1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A + represents a cation.
• POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
  申请人：SESHIMO Takehiro

  公开号：US20100297560A1

  公开（公告）日：2010-11-25

  A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein represents an anion moiety represented by one of general formulas (1) to (5)).
• US7713679B2
  申请人：——

  公开号：US7713679B2

  公开（公告）日：2010-05-11