[EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE À LA RADIATION, ET FILM SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE À LA RADIATION ET PROCÉDÉ DE FORMATION DE MOTIF, CHACUN L'UTILISANT
申请人:FUJIFILM CORP
公开号:WO2013147286A1
公开(公告)日:2013-10-03
An actinic ray-sensitive or radiation-sensitive resin composition in the present invention contains a nitrogen-containing compound (N) which is represented by the following general formula (N1):wherein, in the general formula (N1), X represents a group including a hetero atom; L represents a single bond or an alkylene group; R2 represents a substituent, in the case where a plurality of R2's are present, they may be the same as or different from each other and a plurality of R2's may be bonded to each other to form a ring;R3 represents a hydrogen atom or a substituent; and n represents an integer of 0 to 4.