Trimethyl-<3-hydroxy-propyl>-ammoniumhydroxid, γ-Homocholin | 60531-76-2

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Trimethyl-<3-hydroxy-propyl>-ammoniumhydroxid, γ-Homocholin
• 英文别名: (3-hydroxy-propyl)-trimethyl-ammonium; hydroxide；(3-Hydroxy-propyl)-trimethyl-ammonium; Hydroxid；3-Hydroxypropyl(trimethyl)azanium;hydroxide
• CAS: 60531-76-2
• 化学式: C₆H₁₆NO*HO
• 分子量: 135.206
• InChiKey: AJEUSSNTTSVFIZ-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  9
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  21.2
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Trimethyl-<3-hydroxy-propyl>-ammoniumhydroxid, γ-Homocholin 生成 3-二甲氨基-1-丙醇
  参考文献：
  名称：

  Pyrolysis of γ-Hydroxyalkyl Quaternary Ammonium Hydroxides and Alkoxides. Acyclic Systems^1,2

  摘要：

  DOI：

  10.1021/jo01062a010
• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 silver(l) oxide 作用下， 生成 Trimethyl-<3-hydroxy-propyl>-ammoniumhydroxid, γ-Homocholin
  参考文献：
  名称：

  Malengreau; Lebailly, Hoppe-Seyler's Zeitschrift fur Physiologische Chemie, 1910, vol. 67, p. 38

  摘要：

  DOI：

文献信息

• pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates
  申请人：MALLINCKRODT BAKER, Inc.

  公开号：EP0678571A2

  公开（公告）日：1995-10-25

  Aqueous alkaline cleaning solutions for cleaning microelectronic substrates and maintaining substrate surface smoothness comprise a metal ion free base, a nonionic surfactant and a component to reduce or control the pH of the cleaning solution to a pH within the range of from about pH 8 to about pH 10.

  用于清洁微电子基底和保持基底表面光滑度的碱性水基清洁溶液包括一种不含金属离子的碱、一种非离子表面活性剂和一种将清洁溶液的 pH 值降低或控制在约 pH 8 至约 pH 10 范围内的成分。
• Cleaning wafer substrates of metal contamination while maintaining wafer smoothness
  申请人：MALLINCKRODT BAKER, Inc.

  公开号：EP0690483A2

  公开（公告）日：1996-01-03

  Process for cleaning wafer substrates of metal contamination while maintaining wafer smoothness by contacting the wafer substrates with a cleaning composition comprising an aqueous, metal ion-free base and an amphoteric surfactant and optionally a metal complexing agent and a propylene glycol ether organic solvent.

  在保持晶片平滑度的同时清除晶片基板上的金属污染物的工艺，方法是将晶片基板与清洗组合物接触，该组合物包括不含金属离子的水基和两性表面活性剂，以及可选的金属络合剂和丙二醇醚有机溶剂。
• PROCESS FOR PRODUCING POLYURETHANE EMULSION FOR WATER-BASED ONE-PACK TYPE COATING MATERIAL
  申请人：Nippon Polyurethane Industry Co., Ltd.

  公开号：EP1721947A1

  公开（公告）日：2006-11-15

  [PROBLEMS] The invention is to provide an aqueous one-component coating agent that is environmentally friendly and safe, and is excellent in productivity and storage stability, and also in alkali resistance and solvent resistance of a coated film. [MEANS FOR SOLVING PROBLEMS] The problems are solved by providing a method for producing polyurethane emulsion for an aqueous one-component coating agent, comprising: reacting an organic diisocyanate (a1), a high molecular weight polyol (a2) and a low molecular weight glycol containing a carboxyl group (a3) to produce an isocyanate-terminated urethane prepolymer having a carboxyl group (A); mixing the urethane prepolymer (A) with a polyisocyanate containing a nonionic polar group (B); neutralizing the carboxyl group in the system with a neutralizing agent (C); and subjecting the mixture to emulsification in water and chain extension with water or an amine.

  [问题] 本发明旨在提供一种单组分水性涂布剂，该涂布剂环保、安全、生产效率高、储 存稳定性好、涂膜耐碱性和耐溶剂性好。 [解决问题的方法] 为了解决上述问题，我们提供了一种生产单组分水性涂料用聚氨酯乳液的方法，该方法包括： 1：使有机二异氰酸酯（a1）、高分子量多元醇（a2）和含有羧基的低分子量乙二醇 （a3）反应，生成具有羧基（A）的异氰酸酯封端聚氨酯预聚物；将聚氨酯预聚物 (A) 与含有非离子极性基团的多异氰酸酯 (B) 混合；用中和剂 (C) 中和体系中的羧基；以及将混合物在水中乳化，并用水或胺进行扩链。
• Polyisocyanate-based adhesive composition
  申请人：HUNTSMAN INTERNATIONAL LLC

  公开号：EP1970420A1

  公开（公告）日：2008-09-17

  Adhesive prepared by reacting an organic polyisocyanate with a compound containing isocyanate-reactive hydrogen atoms in the presence of a trimerisation catalyst.

  在三聚催化剂作用下，使有机多异氰酸酯与含有异氰酸酯活性氢原子的化合物发生反应而制备的粘合剂。
• AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE
  申请人：JSR Corporation

  公开号：EP2131389A1

  公开（公告）日：2009-12-09

  A chemical mechanical polishing aqueous dispersion includes (A) colloidal silica having an average particle size calculated from the specific surface area determined by the BET method of 10 to 60 nm, (B) an organic acid having two or more carboxyl groups and one or more hydroxyl groups in one molecule, and (C) a quaternary ammonium compound shown by the following general formula (1), wherein R1 to R4 individually represent hydrocarbon groups, and M- represents an anion, the chemical mechanical polishing aqueous dispersion having a pH of 3 to 5.

  一种化学机械抛光水分散液包括：(A) 胶体二氧化硅，其平均粒径根据 BET 法测定的比表面积计算为 10 至 60 纳米；(B) 有机酸，其一个分子中含有两个或两个以上的羧基和一个或一个以上的羟基；(C) 季铵化合物，其通式如下(1)、 其中 R1 至 R4 分别代表烃基，M- 代表阴离子，化学机械抛光水分散液的 pH 值为 3 至 5。