Dimethyl-<4-ethoxy-naphthyl-(1)>-carbinol | 101869-93-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: Dimethyl-<4-ethoxy-naphthyl-(1)>-carbinol
• 英文别名: 2-(4-Ethoxynaphthalen-1-yl)propan-2-ol
• CAS: 101869-93-6
• 化学式: C₁₅H₁₈O₂
• 分子量: 230.307
• InChiKey: SRSGLVBQSQYGAS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  29.5
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Dimethyl-<4-ethoxy-naphthyl-(1)>-carbinol 生成 1-Methyl-1-<4-aethoxy-naphthyl-(1)>-aethylen
  参考文献：
  名称：

  Lapkin,I.I.; Rybakova,M.N., Journal of general chemistry of the USSR, 1960, vol. 30, p. 2656 - 2658

  摘要：

  DOI：
• 作为产物：
  描述：

  丙酮 、 生成 Dimethyl-<4-ethoxy-naphthyl-(1)>-carbinol
  参考文献：
  名称：

  Lapkin,I.I.; Rybakova,M.N., Journal of general chemistry of the USSR, 1960, vol. 30, p. 2656 - 2658

  摘要：

  DOI：

文献信息

• SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170154766A1

  公开（公告）日：2017-06-01

  The present invention provides a silicon-containing condensate comprising one or more repeating units selected from a repeating unit shown by the following general formula (A1), a repeating unit shown by the following general formula (A2), and a repeating unit shown by the following general formula (A3), wherein R 1 represents a group shown by the following general formula (A-1) or (A-2); R 2 and R 3 each independently represent the same group as R 1 , a hydrogen atom, or a monovalent organic group having 1 to 30 carbon atoms other than R 1 . There can be provided a silicon-containing condensate to give a composition for forming a silicon-containing resist under layer film which can form a resist under layer film with good adhesiveness to any resist pattern, whether the pattern is formed by negative development or positive development.