2,11-dimethyldinaphtho<1,2-b:2',1'-d>thiophene | 135517-66-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2,11-dimethyldinaphtho<1,2-b:2',1'-d>thiophene
• 英文别名: 2,11-Dimethyldinaphtho<1,2-b:2',1'-d>thiophen；8,16-Dimethyl-12-thiapentacyclo[11.8.0.02,11.05,10.014,19]henicosa-1(13),2(11),3,5(10),6,8,14(19),15,17,20-decaene
• CAS: 135517-66-7
• 化学式: C₂₂H₁₆S
• 分子量: 312.435
• InChiKey: JTMNRAOVKIOEOX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.5
• 重原子数：
  23
• 可旋转键数：
  0
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  28.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  2,11-dimethyldinaphtho<1,2-b:2',1'-d>thiophene 在 双氧水 、 溶剂黄146 作用下， 反应 0.33h， 以75%的产率得到2,11-Dimethyldinaphtho<1,2-b:2',1'-d>thiophensulfon
  参考文献：
  名称：

  Nink, Gunter; Boberg, Friedrich, Phosphorus, Sulfur and Silicon and the Related Elements, 1991, vol. 60, # 3/4, p. 281 - 285

  摘要：

  DOI：
• 作为产物：
  描述：

  7-甲基-3,4-二氢-2H-1-萘酮 在 邻四氯苯醌 、 tetraphosphorus decasulfide 作用下， 以 1,4-二氧六环 、 甲苯 为溶剂， 反应 80.0h， 生成 2,11-dimethyldinaphtho<1,2-b:2',1'-d>thiophene
  参考文献：
  名称：

  Nink, Gunter; Boberg, Friedrich, Phosphorus, Sulfur and Silicon and the Related Elements, 1991, vol. 57, # 34, p. 227 - 233

  摘要：

  DOI：

文献信息

• NINK, GUNTER;BOBERG, FRIEDRICH, PHOSPH., SULFUR AND SILICON AND RELAT. ELEM., 57,(1991) N-4, C. 227-233
  作者：NINK, GUNTER、BOBERG, FRIEDRICH

  DOI：——

  日期：——
• COMPOSITION AND POLYMER COMPOUND, AND ORGANIC SEMICONDUCTOR DEVICE COMPRISING THE COMPOSITION OR THE POLYMER COMPOUND
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170025613A1

  公开（公告）日：2017-01-26

  A composition comprising a polymer compound containing a structural unit represented by the formula (1) and a compound represented by the formula (2): [wherein Ring A and Ring B each independently represent a heterocyclic ring, and this heterocyclic ring may have a substituent. Ring C represents an aromatic hydrocarbon ring or a heterocyclic ring, and these rings may have a substituent. Z 1 represents a group represented by the formula (Z-1), a group represented by the formula (Z-2), a group represented by the formula (Z-3), a group represented by the formula (Z-4) or a group represented by the formula (Z-5). A plurality of Z 1 may be mutually the same or different.] [wherein R 1 represents an alkyl group, a cycloalkyl group, an alkoxy group, a cycloalkoxy group, an alkylthio group, a cycloalkylthio group, an aryl group or a monovalent heterocyclic ring group, and these groups may have a substituent. When there are a plurality of R 1 , they may be the same or different.] [wherein n represents an integer of 1 or more. Ring D and Ring F each independently represent a benzene ring, a 5-membered heterocyclic ring or a 6-membered heterocyclic ring, and these rings may have a substituent. Ring E represents a benzene ring, a cyclopentadiene ring, a 5-membered heterocyclic ring or a 6-membered heterocyclic ring, and these rings may have a substituent. When there are a plurality of Rings E, they may be the same or different. Here, Ring D and Ring E are mutually condensed to form a condensed ring, Ring E and Ring F are mutually condensed to form a condensed ring, and when there are a plurality of Rings E, adjacent Rings E are mutually condensed to form a condensed ring.].
• FILM AND ORGANIC SEMICONDUCTOR DEVICE CONTAINING THE FILM
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170110665A1

  公开（公告）日：2017-04-20

  A film comprising a polymer compound and a low molecular weight compound having carrier transportability, wherein the content of the low molecular weight compound is 5 to 40 parts by mass with respect to 100 parts by mass of the sum of the polymer compound and the low molecular weight compound, the diffraction intensity A specified by the following measuring method A is 3 to 50, and the intensity ratio (A/B) of the diffraction intensity A specified by the following measuring method A to the diffraction intensity B specified by the following measuring method B is 30 or less: (Measuring method A) the diffraction intensity A is the maximum diffraction intensity in a range of scattering vector of 1 nm −1 to 5 nm −1 in a profile obtained by an Out-of plane measuring method using a film X-ray diffraction method; (Measuring method B) the diffraction intensity B is the maximum diffraction intensity in a range of scattering vector of 10 nm −1 to 21 nm −1 in a profile obtained by an In-plane measuring method using a film X-ray diffraction method.
• US9818946B2
  申请人：——

  公开号：US9818946B2

  公开（公告）日：2017-11-14