3,3-dimethyl-1,2-dioxane | 86030-07-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二恶烷
• 英文名称: 3,3-dimethyl-1,2-dioxane
• 英文别名: dimethyldioxane；3,3-Dimethyldioxane
• CAS: 86030-07-1
• 化学式: C₆H₁₂O₂
• 分子量: 116.16
• InChiKey: JANBWVMGKFAJAY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  8
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1-溴-4-叔丁基过氧-4-甲基戊烷 在 silver tetrafluoroborate 作用下， 以 二氯甲烷 为溶剂， 以70%的产率得到3,3-dimethyl-1,2-dioxane
  参考文献：
  名称：

  过氧化物和氢过氧化物的分子内烷基化；过氧on中间体的过氧化物转移

  摘要：

  一系列同源的过氧溴化物在有机溶剂中与银离子反应。环状过氧化物的形成与过氧化物转移到最初带有溴的碳上同时发生。在这些分子内烷基化中观察到优选五元环过氧鎓离子形成。

  DOI：

  10.1016/s0040-4039(00)81459-8

文献信息

• [EN] PROCESS FOR PREPARING CYCLIC ESTERS AND CYCLIC AMIDES<br/>[FR] PROCÉDÉ DE PRÉPARATION D'ESTERS CYCLIQUES ET D'AMIDES CYCLIQUES
  申请人：TOTAL RES & TECHNOLOGY FELUY

  公开号：WO2014122294A1

  公开（公告）日：2014-08-14

  The invention relates to a process for preparing a cyclic ester or a cyclic amide, comprising the step of: contacting at least one hydroxycarboxylic acid and/or at least one amino-carboxylic acid; or an ester, or salt thereof; wherein said hydroxycarboxylic acid is a 2-hydroxycarboxylic acid,or a 6–hydroxycarboxylic acid; and wherein said amino carboxylic acid is a 2-amino-carboxylic acid or a 6-amino-carboxylic acid; with at least one acidic zeolite comprising: - two or three interconnected and non-parallel channel systems, wherein at least one of said channel systems comprises 10-or more-membered ring channels; and a framework Si/X2 ratio of at least 24 as measured by NMR; or - three interconnected and non-parallel channel systems, wherein at least two of said channel systems comprise 10-or more-membered ring channels; and a framework Si/X2 ratio of at least 6 as measured by NMR; wherein each X is Al or B, and wherein the process is performed at a pressure between 0.5 and 20 bar.

  该发明涉及一种制备环酯或环酰胺的过程，包括以下步骤：接触至少一种羟基羧酸和/或至少一种氨基羧酸；或其酯或盐；其中所述羟基羧酸是2-羟基羧酸或6-羟基羧酸；所述氨基羧酸是2-氨基羧酸或6-氨基羧酸；与至少一种含有酸性沸石的接触：- 两个或三个相互连接且非平行的通道系统，其中至少一个通道系统包括10个或更多环成员的环通道；并且通过NMR测量的框架Si/X2比至少为24；或- 三个相互连接且非平行的通道系统，其中至少两个通道系统包括10个或更多环成员的环通道；并且通过NMR测量的框架Si/X2比至少为6；其中每个X是Al或B，并且该过程在0.5至20巴的压力下进行。
• AROMATIC COMPOUND, PHARMACEUTICAL COMPOSITION AND USE THEREOF
  申请人：Sichuan Kelun-Biotech Biopharmaceutical Co., Ltd.

  公开号：US20200239429A1

  公开（公告）日：2020-07-30

  The invention relates to an aromatic compound, pharmaceutical composition comprising the same, and a method for preparing the compound and an intermediate thereof. The invention also relates to use of the compound for the manufacture of a medicament for the prevention or treatment of a PPAR-related disease.

  该发明涉及一种芳香化合物，包括该化合物的药物组合物，以及制备该化合物及其中间体的方法。该发明还涉及利用该化合物制备用于预防或治疗PPAR相关疾病的药物的用途。
• [EN] PREPARATION PROCESS OF ORTHO ALKOXY BISPHENOL MONOMERS<br/>[FR] PROCÉDÉ DE PRÉPARATION DE MONOMÈRES D'ORTHOALCOXY BISPHÉNOL
  申请人：UNIV LEUVEN KATH

  公开号：WO2019002503A1

  公开（公告）日：2019-01-03

  A process for making ortho alkoxy bisphenol monomers includes contacting an (alk-1-enyl)alkoxyphenol (type 1) with an alkoxyphenol (type 2) in the presence of an acidic catalyst. Both type of renewable phenols (type 1 and 2) can be generated from lignocellulosic biomass. The use of such alkoxy phenols as a precursor to bisphenol monomers has the potential to reduce the cost and environmental impact of structural materials, while meeting or exceeding the performance of current petroleum-derived polymers, such as thermoplastics and thermoset resins.

  制备邻烷氧基双酚单体的过程包括将（烯基）烷氧基酚（类型1）与烷氧基酚（类型2）在酸性催化剂存在下接触。这两种可再生酚（类型1和2）均可从木质纤维素生物质中生成。将这种烷氧基酚用作双酚单体的前体有潜力降低结构材料的成本和环境影响，同时满足或超越当前石油衍生聚合物（如热塑性塑料和热固性树脂）的性能。
• [EN] NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME<br/>[FR] NOUVEAU COMPOSÉ, MATÉRIAU SEMI-CONDUCTEUR, PROCÉDÉS DE FABRICATION DE REVÊTEMENT ET SEMI-CONDUCTEUR L'UTILISANT
  申请人：MERCK PATENT GMBH

  公开号：WO2018115043A1

  公开（公告）日：2018-06-28

  An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.

  提供一种在溶剂中具有高溶解性且具有有利的填充性能、高耐热性和/或高耐蚀性的半导体材料和涂层是一个目标。另一个目标是提供一种使用该半导体材料制造半导体的方法。还有一个目标是提供一种新型化合物。提供的是：由特定芳香烃环衍生物组成的半导体材料；使用该半导体材料制造涂层和半导体的方法；以及由特定芳香烃环衍生物组成的化合物。
• COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20190094695A1

  公开（公告）日：2019-03-28

  The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R 1 to R 4 bond. Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

  影片形成的组合物包括一个化合物，其中包括一个公式（1）的基团和一个溶剂。在公式（1）中，R1至R4分别代表氢原子，具有1至20个碳原子的一价有机基团，或者R1至R4一起代表具有3至20个环原子的环结构，该环结构与碳原子或R1至R4键合的碳链一起。Ar1代表通过从具有6至20个碳原子的芳香环中去除（n+3）个氢原子而获得的基团。n为0至9之间的整数。R5代表一个羟基，一个卤素原子，一个硝基，或者具有1至20个碳原子的一价有机基团。