The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1:
1
wherein R
1
to R
3
are as defined in the specification. Of the oxymethylamine compound of the formula 1, the compound represented by the following formula 7:
2
wherein R
2
to R
5
and n are as defined in the specification, is a novel compound.
本发明的光刻胶剥离组合物含有至少一种由下式 1 表示的氧
甲胺化合物:
1
其中 R
1
至 R
3
如说明书中所定义。在式 1 的氧
甲胺化合物中,下式 7 所代表的化合物:
2
其中 R
2
至 R
5
和 n 如说明书中所定义,是一种新型化合物。