Proton magnetic resonance studies of compounds with bridgehead nitrogen atoms—XXVI
作者:T.A. Crabb、M.J. Hall、R.O. Williams
DOI:10.1016/s0040-4020(01)93494-5
日期:1973.1
3′-disubstituted, and 3,5-disubstitted perhydro-7a-methyloxazolo[3,4-c]oxazoles has been synthesised. Some indication of the predominant conformations of these systems and of the related perhydro-imidazo[1,5-c]thiazoles is obtainable from the magnitude of the geminal coupling constants of the methylene group protons situated between the heteroatoms.
已经合成了一系列的3-单取代的,3,3'-二取代的和3,5-二取代的全氢-7a-甲基恶唑并[3,4- c ]恶唑。这些体系和相关的全氢咪唑并[1,5- c ]噻唑的主要构型的某些迹象可从位于杂原子之间的亚甲基质子的双键偶合常数的大小获得。
METHOD FOR FRACTIONATING STEREOISOMERIC COMPOUNDS
申请人:Jakel Christoph
公开号:US20090030235A1
公开(公告)日:2009-01-29
The present invention relates to a method for fractionating stereoisomeric compounds which have at least one alcohol and/or amino group.
本发明涉及一种用于分离具有至少一种醇和/或氨基团的立体异构化合物的方法。
10a-Azalide Compound
申请人:Sugimoto Tomohiro
公开号:US20090281292A1
公开(公告)日:2009-11-12
[Object]: To provide a compound having a novel structure effective against
Hemophilus influenzae
and erythromycin resistant bacteria (for example, resistant pneumococci and streptococci) as well as against conventional erythromycin sensitive bacteria.
[Solution]: A novel 10a-azalide compound represented by the formula (I), a pharmaceutically acceptable salt thereof or a solvate thereof, or an intermediate for the preparation of the same. The compound of the present invention has superior antibacterial activity against
Hemophilus influenzae
, erythromycin resistant pneumococci and the like, and therefore, the compound can be used as a therapeutic agent of infectious diseases.
Dynamic multi-purpose composition for the removal of photoresists and method for its use
申请人:Dynaloy, LLC
公开号:EP2657770A1
公开(公告)日:2013-10-30
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.
Dynamic multi-purpose composition for the removal of photoresists
申请人:Dynaloy, LLC
公开号:EP2657771A1
公开(公告)日:2013-10-30
Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt.% water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided.