作者:Erwin Buncel、T.Krishnan Venkatachalam U. Edlund
DOI:10.1016/0022-328x(92)83433-i
日期:1992.8
Organosilyl potassium compounds are conveniently generated by cleavage of hexaorganodisilanes with potassium t-butoxide in common solvents other than HMPA (i.e. in THF or DME). Nucleophilic attack on unsymmetrical disilanes results in formation of the more stable silyl anion, i.e. the one with the most phenyl groups bonded to silicon.
有机甲硅烷基钾化合物可通过在HMPA以外的常用溶剂(即THF或DME)中用叔丁醇钾裂解六有机二硅烷来生成。对不对称乙硅烷的亲核攻击导致形成更稳定的甲硅烷基阴离子,即,具有最多苯基键合到硅上的甲硅烷基阴离子。