Photoacid generators, chemically amplified resist compositions, and patterning process
申请人:——
公开号:US20040229162A1
公开(公告)日:2004-11-18
Photoacid generators have formula (1) wherein R
1
and R
2
are alkyl, or R
1
and R
2
, taken together, may form a C
4
-C
6
ring structure with sulfur, R is hydrogen or alkyl, R′ is hydrogen, alkyl, alkoxyl or nitro, n is 1 to 6, and Y
−
is alkylsulfonate, arylsulfonate, bisalkylsulfonylimide or trisalkylsulfonylmethide. Chemically amplified resist compositions comprising the same have improved resolution, thermal stability, storage stability and minimized line edge roughness.
1
光酸发生剂的化学式为(1),其中R1和R2是烷基,或者R1和R2结合在一起,可以形成带有硫的C4-C6环结构,R为氢或烷基,R'为氢、烷基、烷氧基或硝基,n为1至6,Y-为烷基磺酸盐、芳基磺酸盐、双烷基磺酰亚胺或三烷基磺酰甲基。包含上述光酸发生剂的化学增感型光阻组合物具有更好的分辨率、热稳定性、储存稳定性和最小化线边粗糙度。