A precursor for the deposition of a thin film by atomic layer deposition is provided. The compound has the formula M
x
L
y
where M is a metal and L is an amidrazone-derived ligand or an amidate-derived ligand. A process of forming a thin film using the precursors is also provided.
提供了一种用于原子层沉积薄膜的前体。该化合物具有MxLy的公式,其中M是
金属,L是来自酰胺
肼衍生的
配体或酰胺酸衍生的
配体。还提供了使用前体形成薄膜的过程。