Zhukova,T.I. et al., Journal of Organic Chemistry USSR (English Translation), 1975, vol. 11, p. 2018 - 2019
作者:Zhukova,T.I. et al.
DOI:——
日期:——
Photosensitive composition and forming process of structured material using the composition
申请人:Yamada Kenji
公开号:US20060210929A1
公开(公告)日:2006-09-21
The invention provides a photosensitive composition for forming a highly heat-resistant pattern of a micro phase separation structure. The photosensitive composition comprises: (A) a block copolymer containing a segment composed of an alkoxysilyl-group-containing monomer as a repeating unit, and (B) a photosensitive decomposition agent. The polydispersity index (Mw/Mn) of the block copolymer is 1.8 or lower.
Pentaerythritol Derivatives. II. 3-Halomethyl-3-hydroxymethyl Oxetanes<sup>1</sup>
作者:COSTAS H. ISSIDORIDES、RIZA C. GULEN、NAZAR S. APRAHAMIAN