申请人:NIPPON KAYAKU KABUSHIKI KAISHA
公开号:EP1600812A1
公开(公告)日:2005-11-30
A photosensitive resin composition that excels in sensitivity to actinic energy rays (photosensitivity), is hardenable within a short period of time and can form pattern through development with a diluted aqueous alkali solution and that gives a cured film through thermal curing in the postcuring step, the cured film having satisfactory flexibility and being suitable to a solder mask ink of high insulation excelling in adherence and resistances of gold plating, electroless gold plating and tin plating; and a curing product thereof. In particular, a photosensitive resin composition characterized by comprising (1) a urethane resin (A) soluble in aqueous alkali solutions, the urethane resin obtained by urethanizing in the absence of catalyst a diisocyanate compound (a), a diol compound having an ethylenically unsaturated group in its molecule (b) and a diol compound having a carboxyl group in its molecule (c) optionally together with a diol compound not having any ethylenically unsaturated group or carboxyl group in its molecule (d) and reacting the reaction product with a cyclic acid anhydride (e); (2) photopolymerization initiator (B); and (3) a reactive crosslinking agent (C).
一种光敏树脂组合物,该组合物对放电能量射线(光敏性)的敏感性优异,可在短时间内硬化,通过稀释的碱水溶液显影可形成图案,通过后固化步骤的热固化可得到固化膜,固化膜具有令人满意的柔韧性,适用于高绝缘性的阻焊油墨,该阻焊油墨的附着力和抗镀金、无电解镀金和镀锡的能力优异;及其固化产品。特别是一种光敏树脂组合物,其特征在于包括 (1) 可溶于碱水溶液的聚氨酯树脂 (A),该聚氨酯树脂是通过在无催化剂的情况下对二异氰酸酯化合物 (a) 进行氨基甲酸乙酯化而得到的、分子中含有乙烯不饱和基团的二元醇化合物 (b) 和分子中含有羧基的二元醇化合物 (c),可选择与分子中不含有任何乙烯不饱和基团或羧基的二元醇化合物 (d) 一起反应,并使反应产物与环酸酐 (e) 反应而得到的聚氨酯树脂;(2) 光聚合引发剂 (B);以及 (3) 反应性交联剂 (C)。