9,9-Bis{4-[(prop-2-yn-1-yl)oxy]phenyl}-9H-fluorene | 531492-75-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: 9,9-Bis{4-[(prop-2-yn-1-yl)oxy]phenyl}-9H-fluorene
• 英文别名: 9,9-bis(4-prop-2-ynoxyphenyl)fluorene
• CAS: 531492-75-8
• 化学式: C₃₁H₂₂O₂
• 分子量: 426.5
• InChiKey: IWHVKEDLURQIGZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  33
• 可旋转键数：
  6
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METHOD FOR MANUFACTURING A COATING BY IT, AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING
  申请人：Merck Patent GmbH

  公开号：US20200401046A1

  公开（公告）日：2020-12-24

  [Problem to be Solved] An object is to provide a compound with good heat resistance. And another object is to provide a coating made exhibits less film shrinkage, good gap filling property and good planarization. [Solution] The present invention provides an ethynyl derived composite and a composition comprising thereof. And the present invention provides a method for manufacturing a coating by it, and a method for manufacturing a device.
• COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20210011384A1

  公开（公告）日：2021-01-14

  A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) as a repeating unit, and an organic solvent, where AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent; each R represents a hydrogen atom or a monovalent organic group having 2 to 10 carbon atoms and an unsaturated bond; R′ represents a single bond or W1; and W1 represents a divalent organic group having 6 to 80 carbon atoms and one or more aromatic rings. This invention provides: a composition for forming an organic film, the composition containing a polymer having an indenofluorene structure with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using this composition; and a polymer for providing such a composition for forming an organic film.
• METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
  申请人：Merck Patent GmbH

  公开号：US20220221794A1

  公开（公告）日：2022-07-14

  To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydro-carbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
• US9958781B2
  申请人：——

  公开号：US9958781B2

  公开（公告）日：2018-05-01