[丁基(羟甲基)氨基]甲醇 | 18936-93-1

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: [丁基(羟甲基)氨基]甲醇
• 英文名称: (Butylazanediyl)dimethanol
• 英文别名: [butyl(hydroxymethyl)amino]methanol
• CAS: 18936-93-1
• 化学式: C₆H₁₅NO₂
• 分子量: 133.191
• InChiKey: KMBDVSDHGPWRHE-UHFFFAOYSA-N

物化性质

• 沸点：
  207.1±25.0 °C(Predicted)
• 密度：
  1.025±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  9
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  43.7
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  [丁基(羟甲基)氨基]甲醇 、 10-羟基喜树碱 以 1,4-二氧六环 为溶剂， 生成 (18S)-6-butyl-18-ethyl-18-hydroxy-8,20-dioxa-6,13,24-triazahexacyclo[12.11.0.03,12.04,9.015,24.017,22]pentacosa-1,3(12),4(9),10,13,15,17(22)-heptaene-19,23-dione
  参考文献：
  名称：

  新型六环喜树碱衍生物。第1部分：带有A环稠合的1,3-恶嗪环的喜树碱的合成和细胞毒性。

  摘要：

  首先设计并合成了一系列新的含有1，3-恶嗪环的A环修饰的六环喜树碱衍生物。分析了所有六环喜树碱对九种人类癌细胞系的体外细胞毒性。在这些化合物中，9b和9c对几种细胞系表现出最强的细胞毒性。特别地，对于HEPG-2，9c的效力比喜树碱强约13倍，并且比拓扑替康强约六倍。此外，还发现对于大多数细胞系，N-烷基取代的衍生物比N-芳基和N-苄基取代的化合物更有效。

  DOI：

  10.1016/j.bmcl.2008.05.103
• 作为产物：
  描述：

  聚合甲醛 、 正丁胺 以 1,4-二氧六环 、 水 为溶剂， 反应 2.0h， 生成 [丁基(羟甲基)氨基]甲醇
  参考文献：
  名称：

  Synthesis and characterization of novel 7-hydroxycoumarin derivatives

  摘要：

  描述了几种香豆素曼尼希碱的合成。研究了天然7-羟基香豆素与伯胺和两当量甲醛在碱催化剂存在下的反应。合成了几种新型N-取代角9,10-二氢-2H,8H-色并[8,7-e][1,3]恶嗪-2-酮。反应中使用了不同的脂肪族和芳香族胺，得到了相应的产物，收率中等至较好。

  DOI：

  10.1007/s10600-013-0628-7

文献信息

• [EN] QUATERNARY AMMONIUM COMPOUNDS AND THEIR USE AS FUEL OR LUBRICANT ADDITIVES<br/>[FR] COMPOSÉS D'AMMONIUM QUATERNAIRE ET LEUR UTILISATION EN TANT QU'ADDITIFS DE CARBURANT OU DE LUBRIFIANT
  申请人：INNOSPEC LTD

  公开号：WO2016016641A1

  公开（公告）日：2016-02-04

  A quaternary ammonium salt of formula wherein each of R1, R2, R3 and R4 is independently selected from an optionally substituted alkyl, alkenyl or aryl group having less than 8 carbon atoms and R5 is hydrogen or an optionally substituted hydrocarbyl group.

  一种四元铵盐，其化学式为其中R1，R2，R3和R4各自独立地选自不超过8个碳原子的可选择取代的烷基，烯基或芳基，而R5是氢或可选择取代的烃基。
• WATER RESISTANCE IMPROVING AGENT FOR INKJET RECORDING PAPER AND INKJET RECORDING PAPER
  申请人：Nicca Chemical Co., Ltd.

  公开号：EP1068959A1

  公开（公告）日：2001-01-17

  An agent for improving water resistance of ink-jet recording paper which comprises a cationic polyurethane resin obtained by neutralizing amine structures or quaternizing a tertiary amine structure in molecules of a polyurethane which is obtained by reacting (A) an organic isocyanate compound having 2 or more isocyanate groups with (B) a tertiary amine compound having 2 to 10 groups each selected from hydroxyl group and amino group in amounts such that a ratio by equivalent of the isocyanate group to a total of the hydroxyl group and the amino group is 0.5 to 3.0 and an ink-jet recording paper coated with the agent. By coating ink-jet recording paper of regular paper or coated paper with the agent for improving water resistance of ink-jet recording paper of the present invention, water resistance of images and characters recorded on the recording paper is improved and blotting with ink is suppressed.

  一种用于提高喷墨记录纸耐水性的制剂一种用于提高喷墨记录纸耐水性的制剂，它包括一种阳离子聚氨酯树脂，该树脂是通过中和聚氨酯分子中的胺结构或季胺化聚氨酯分子中的叔胺结构而得到的，该聚氨酯是通过(A)具有 2 个或 2 个以上异氰酸酯基团的有机异氰酸酯化合物与(B)具有 2 至 10 个从羟基和氨基中各选出的基团的叔胺化合物反应而得到的，反应量为异氰酸酯基团与羟基和氨基的总和的当量比为 0.5 至 3.0。5至3.0，以及涂有该剂的喷墨记录纸。通过在普通纸或铜版纸的喷墨记录纸上涂布本发明的改善喷墨记录纸耐水性的药剂，可改善记录纸上记录的图像和字符的耐水性，并可抑制墨水晕染。
• Composition for film formation, method of film formation, and insulating film
  申请人：JSR Corporation

  公开号：EP1088868A2

  公开（公告）日：2001-04-04

  A polyorganosiloxane-based composition for film formation which gives a film having low dielectric constant and high modulus of elasticity and useful as an interlayer insulating film in semiconductor devices and the like. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of an alkali catalyst, at least one member selected from the group consisting of compounds (1) represented by RaSi(OR1)4-a (wherein R represents hydrogen, fluorine, or a monovalent organic group; R1 represents a monovalent organic group; and a Is an integer of 1 or 2), compounds (2) represented by Si(OR2)4 (wherein R2 represents a monovalent organic group), and compounds (3) represented by R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c [wherein R3 to R6 may be the same or different and each represent a monovalent organic group; b and c may be the same or different and each are an integer of 0 to 2; R7 represents oxygen, phenylene, or a group represented by -(CH2)n-, wherein n is an integer of 1 to 6; and d is 0 or 1]; and (B) a product of hydrolysis and condensation obtained by hydrolyzing and condensing, in the presence of a metal chelate compound catalyst, at least one member selected from the group consisting of the compounds (1), (2), and (3).

  一种用于成膜的聚有机硅氧烷基组合物，可生成具有低介电常数和高弹性模量的薄膜，可用作半导体器件等的层间绝缘膜。 成膜组合物包括(A) 通过在碱催化剂存在下水解和缩合得到的水解和缩合产物，该产物至少有一个成员选 自由 RaSi(OR1)4-a（其中 R 代表氢、氟或一价有机基团；R1 代表一价有机基团；且 a 是 1 或 2 的整数）、由 Si(OR2)4（其中 R2 代表一价有机基团）代表的化合物 (2) 以及由 R3b(R4O)3-bSi-(R7)d-Si(OR5)3-cR6c 代表的化合物 (3) [其中 R3 至 R6 可以相同或不同，且各自代表一价有机基团；b和c可以相同或不同，且各自为0至2的整数；R7代表氧、亚苯基或由-(CH2)n-代表的基团，其中n为1至6的整数；d为0或1]；以及 (B) 在金属螯合物催化剂存在下，通过水解和缩合得到的至少一种水解和缩合产物，该产物选自由化合物(1)、(2)和(3)组成的组。
• Composition for film formation, method of film formation, and silica-based film
  申请人：JSR Corporation

  公开号：EP1127929A2

  公开（公告）日：2001-08-29

  A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.

  一种用于成膜的组合物，该组合物能够生成具有超低介电常数和更高机械强度的硅基涂膜，并可用作半导体器件等的层间绝缘膜；一种生产该组合物的工艺；以及一种由该组合物生成的硅基涂膜。该组合物包括 (A) 通过水解和缩合一种或多种硅烷化合物而得到的水解和缩合产物，以及 (B) 有机溶剂。
• COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING SAME, SILICA INSULATING FILM AND METHOD FOR FORMING SAME
  申请人：JSR Corporation

  公开号：EP1705208A1

  公开（公告）日：2006-09-27

  An insulating-film-forming composition of the invention includes: a hydrolysis-condensation product obtained by hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C); and an organic solvent.

  本发明的绝缘成膜组合物包括：在聚碳硅烷（B）和碱性催化剂（C）存在下，通过水解和缩合含可水解基团的硅烷单体（A）而得到的水解缩合产物；以及有机溶剂。