trimethyl-pentyl-ammonium; hydroxide | 81137-66-8

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: trimethyl-pentyl-ammonium; hydroxide
• 英文别名: Trimethyl-pentyl-ammonium; Hydroxid；Amyltrimethylammoniumhydroxyd；trimethyl(pentyl)azanium;hydroxide
• CAS: 81137-66-8
• 化学式: C₈H₂₀N*HO
• 分子量: 147.261
• InChiKey: ZMEFBTCKVCNTBG-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  1.71
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  trimethyl-pentyl-ammonium; hydroxide 生成 戊烯 、 N,N-二甲基戊胺 、 三甲胺
  参考文献：
  名称：

  v.Braun, Justus Liebigs Annalen der Chemie, 1911, vol. 382, p. 17

  摘要：

  DOI：

文献信息

• Hydrocarbon Conversion Processes Using UZM-26 and UZM-26X Crystalline Microporous Zeolitic Compositions
  申请人：Miller Mark A

  公开号：US20100152510A1

  公开（公告）日：2010-06-17

  This invention relates to hydrocarbon conversion processes using crystalline zeolitic compositions designated the UZM-26 and UZM-26X. UZM-26 is a microporous three-dimensional zeolitic composition that is derived from UZM-26P (an as synthesized layered composition) by calcination. UZM-26X is a microporous three-dimensional zeolitic composition that is derived from UZM-26PX by calcination, where UZM-26PX is an ion-exchanged form of UZM-26P.

  本发明涉及使用被指定为UZM-26和UZM-26X的晶体沸石组成物进行烃转化过程。 UZM-26是一种微孔三维沸石组成物，通过焙烧从UZM-26P（一种合成层状组成物）派生而来。 UZM-26X是一种微孔三维沸石组成物，通过焙烧从UZM-26PX派生而来，其中UZM-26PX是UZM-26P的离子交换形式。
• Hydrocarbon Conversion Processes Using the UZM-27 Family of Crystalline Aluminosilicate Compositions
  申请人：Miller Mark A.

  公开号：US20100249478A1

  公开（公告）日：2010-09-30

  This invention relates to hydrocarbon conversion processes using a new family of crystalline aluminosilicate compositions designated the UZM-27 family. These include the UZM-27 and UZM-27HS which have unique structures. UZM-27 is a microporous composition which has a three-dimensional structure and is obtained by calcining the as synthesized form designated UZM-27P. UZM-27HS is a high silica version of UZM-27 and includes an essentially pure silica version of UZM-27.

  本发明涉及使用一种新的晶体状铝硅酸盐组合物家族UZM-27家族进行碳氢化合物转化过程。其中包括UZM-27和UZM-27HS，它们具有独特的结构。UZM-27是一种微孔性组合物，具有三维结构，通过焙烧合成形式UZM-27P得到。UZM-27HS是UZM-27的高硅版本，包括UZM-27的基本纯二氧化硅版本。
• HYDROCARBON CONVERSION PROCESSES USING THE UZM-27 FAMILY OF CRYSTALLINE ALUMINOSILICATE COMPOSITIONS
  申请人：Miller Mark A.

  公开号：US20100160701A1

  公开（公告）日：2010-06-24

  This invention relates to hydrocarbon conversion processes using a new family of crystalline aluminosilicate compositions designated the UZM-27 family. These include the UZM-27 and UZM-27HS which have unique structures. UZM-27 is a microporous composition which has a three-dimensional structure and is obtained by calcining the as synthesized form designated UZM-27P. UZM-27HS is a high silica version of UZM-27 and includes an essentially pure silica version of UZM-27.

  本发明涉及使用一种新的晶体铝硅酸盐组合物家族UZM-27家族进行碳氢化合物转化过程。这些包括UZM-27和UZM-27HS，它们具有独特的结构。UZM-27是一种微孔结构，具有三维结构，通过煅烧合成形式UZM-27P获得。UZM-27HS是UZM-27的高硅版本，包括UZM-27的基本纯硅版本。
• Aqueous ink composition for use in an ink-jet printer
  申请人：SEIKO EPSON CORPORATION

  公开号：EP0838508A2

  公开（公告）日：1998-04-29

  An aqueous ink composition for ink jet printers, which gives reliable printing performance and yields printed images which have excellent print quality and which dry rapidly is disclosed. The ink compositions are suitable for printing on plain paper. The ink comprises water as the principal solvent, an anionic colorant, pectic acid, a base, and at least one of a penetrable solvent and/or a penetrability-imparting surfactant. The pectic acid is composed primarily of α-1,4 linked polygalacturonic acid having a degree of esterification not more than 5% where the degree of esterification is defined as the percentage of the total number of galacturonic acid units in the pectic acid which are esterified.

  本发明公开了一种用于喷墨打印机的水性油墨组合物，该组合物具有可靠的打印性能，可打印出打印质量极佳且干燥迅速的图像。这种油墨组合物适用于在普通纸上打印。油墨包括作为主溶剂的水、阴离子着色剂、果胶酸、碱和至少一种可渗透溶剂和/或渗透性促进表面活性剂。果胶酸主要由α-1,4 连接的聚半乳糖醛酸组成，其酯化程度不超过 5%，其中酯化程度定义为果胶酸中酯化的半乳糖醛酸单位总数的百分比。
• Stripping compositions for removing photoresists from semiconductor substrates
  申请人：Fujifilm Electronic Materials U.S.A., Inc.

  公开号：US10266799B2

  公开（公告）日：2019-04-23

  This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one compound comprising at least three hydroxyl groups; 4) at least one carboxylic acid; 5) at least one Group II metal cation; 6) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 7) water. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate.

  本公开涉及含有以下成分的组合物：1）至少一种水溶性极性烷基有机溶剂；2）至少一种氢氧化季铵；3）至少一种包含至少三个羟基的化合物；4）至少一种羧酸；5）至少一种第二类金属阳离子；6）至少一种铜腐蚀抑制剂，该抑制剂选自 6-取代-2,4-二氨基-1,3,5-三嗪组成的组；以及 7）水。这些组合物可以有效地剥离正或负色调抗蚀剂或抗蚀剂残留物，并且对半导体衬底上的凸点和底层金属化材料（如 SnAg、CuNiSn、CuCoCu、CoSn、Ni、Cu、Al、W、Sn、Co 等）无腐蚀性。