The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.
本发明提供了一种抗蚀墨
水组合物,包括一个化合物(a),其分子内至少具有一个
环氧乙烷基团和至少一个环氧基团,以及一种化合物(b),能够在活性能量射线辐射和/或热下启动阳离子聚合。该抗蚀墨
水组合物具有高感光性,可以通过短暂加热最终固化,固化薄膜具有良好的物理性能。