1,1,3,3‐Tetratriflylpropene (TTP): A Strong, Allylic C–H Acid for Brønsted and Lewis Acid Catalysis
作者:Denis Höfler、Manuel van Gemmeren、Petra Wedemann、Karl Kaupmees、Ivo Leito、Markus Leutzsch、Julia B. Lingnau、Benjamin List
DOI:10.1002/anie.201609923
日期:2017.1.24
Tetratrifylpropene (TTP) has been developed as a highly acidic, allylic C–H acid for Brønsted and Lewisacidcatalysis. It can readily be obtained in two steps and consistently shows exceptional catalytic activities for Mukaiyama aldol, Hosomi–Sakurai, and Friedel–Crafts acylation reactions. X‐ray analyses of TTP and its salts confirm its designed, allylic structure, in which the negative charge is
Taming the Lewis superacidity of a pyramidal borane by weakly coordinated anion dissociation enabled the activation of inert C−H bonds and resulted in an unusual coordination mode at boron.
[EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
申请人:BASF SE
公开号:WO2010046240A1
公开(公告)日:2010-04-29
Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
申请人:——
公开号:US20030235782A1
公开(公告)日:2003-12-25
The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.
Provided is a novel sulfonium salt that has high solubility in a solvent and has high light sensitivity to, especially, light having a wavelength not longer than deep-UV (254 nm) and a novel photo-acid generator comprising the sulfonium salt. The invention relates to a sulfonium salt represented by the following general formula (1) and a novel photo-acid generator comprising the sulfonium salt.
wherein R
1
represents an electron withdrawing group; R
2
and R
3
each independently represent an alkyl group having 1 to 5 carbon atoms, an alkoxy group, an acyl group, a halogenated alkyl group, a halogen atom, a hydroxyl group, a cyano group, or a nitro group; p and q each independently represent an integer of 0 to 5; and X
−
represents a monovalent counter anion.