Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula —OC(CH
3
)
2
CF
3
and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
提供用于形成光刻胶的单体和聚合物。更具体地说,提供了用于微影的光刻胶、单体和聚合物,特别是具有降低光密度的酸敏基团的单体。由此产生的光刻胶在157nm光下具有改善的透明度。光刻胶组合物由至少一种不溶于
水的酸分解聚合物混合而成,该聚合物是由至少一种含有公式—OC(
CH3)2CF3的酸敏基团的单体单元制备而成,并且在约157nm的紫外辐射下具有相当的透明度,以及至少一种光酸发生剂,能够在约157nm的激活能量下产生酸。