Ethynylsilanes, RnSi(CCH)4-n (n = 0 to 3), can be prepared in satisfactory yields from RnSiCl4-n and HCCMgCl in tetrahydrofuran. Losses occur through (a) polymerization under the influence of the cyclic ether and (b) metallation of the ethynylsilanes to SiCCMgCl which provokes the formation of sila-acetylene chains and rings. Some of these compounds of higher molecular weight have been isolated
乙炔基硅烷R n Si(CCH)4-n(n = 0至3),可以由R n SiCl 4-n和HCCMgCl在四氢呋喃中以令人满意的产率制备。损失是通过(a)在环醚的影响下聚合和(b)乙炔基硅烷金属化成SiCCMgCl引起的,从而促使形成硅乙炔链和环。这些高分子量化合物中的一些已经被分离出来。
Synthesis and Structure of Tetraethynylsilane and Its Silylated Derivatives
作者:Florian L. Geyer、Frank Rominger、Uwe H. F. Bunz
DOI:10.1002/chem.201400105
日期:2014.3.24
The known tetrakis((trimethylsilyl)ethynyl)silane was prepared and deprotected. By using trifluoromethanesulfonic acid, the smooth stepwise desilylation of the starting material was achieved, and all of the partially protected and the fully deprotected species were isolated by sublimation. Crystal structures of all of the partially and the fully deprotected species were obtained. None of the compounds