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3,4,5-trihydroxystyrene

中文名称
——
中文别名
——
英文名称
3,4,5-trihydroxystyrene
英文别名
5-Ethenylbenzene-1,2,3-triol
3,4,5-trihydroxystyrene化学式
CAS
——
化学式
C8H8O3
mdl
——
分子量
152.15
InChiKey
ZZMFDMIBZYLXQE-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.6
  • 重原子数:
    11
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    60.7
  • 氢给体数:
    3
  • 氢受体数:
    3

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    3,4,5-三羟基肉桂酸 反应 4.0h, 以75%的产率得到3,4,5-trihydroxystyrene
    参考文献:
    名称:
    取代肉桂酸在低共熔溶剂中的无金属和无碱脱羧
    摘要:
    摘要 在 DES 中开发了一种无金属和无碱的策略,通过肉桂酸衍生物的脱羧作用首次合成苯乙烯,这提供了一种可再生且具有成本效益的协议来获取各种苯乙烯,包括具有 4-乙烯基苯酚等官能团的苯乙烯。和1-氯-4-乙烯基苯。图形概要
    DOI:
    10.1080/00397911.2019.1708945
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文献信息

  • Novel Sirtuin Activating Compounds and Methods for Making the Same
    申请人:Andrus Merritt B.
    公开号:US20080255382A1
    公开(公告)日:2008-10-16
    The present invention includes methods for preparing resveratrol, resveratrol esters and substituted and unsubstituted stilbenes of the formula given below; where each Y is —O or halogen, each Z is —O or halogen, each n and each m is independently the value of 0, 1, 2, 3, 4 or 5, each A and each B is independently selected from P n , R or absent, each V and each W is independently selected from P n , straight or branched alkyl of from (2) to (6) carbon atoms and cycloalkyl of from (3) to (8) carbon atoms, alkoxy, phenyl, benzyl or halogen, R is independently selected from the group comprising alkyl with at least one carbon atom, aryl and aralkyl, P n is an alcohol protecting group and diastereoisomers of the foregoing. The compounds are made from a multi-step process including a N-heterocyclic carbon-type ligand coupling in the presence of a base with benzyol halide and styrene coupling partners. These compounds show increased stability for use in the food, cosmetic and pharmaceutical industries.
    本发明涉及一种制备白藜芦醇、白藜芦醇酯和给定以下结构式的取代和未取代的stilbenes的方法;其中每个Y是—O或卤素,每个Z是—O或卤素,每个n和每个m独立地取值为0、1、2、3、4或5,每个A和每个B独立地从Pn、R或缺席中选择,每个V和每个W独立地从Pn、由(2)到(6)个碳原子的直链或支链烷基和由(3)到(8)个碳原子的环烷基、烷氧基、苯基、苄基或卤素中选择,R独立地从包括至少一个碳原子的烷基、芳基和芳基烷基的群体中选择,Pn是醇保护基和上述化合物的对映异构体。这些化合物是通过多步过程制备的,其中包括在碱存在下与苄基卤和苯乙烯偶联合成N-杂环碳型配体偶联。这些化合物在食品、化妆品和制药行业中显示出增强的稳定性。
  • 一种一锅法合成羟基苯乙烯类化合物的方法
    申请人:上海博栋化学科技有限公司
    公开号:CN108640819A
    公开(公告)日:2018-10-12
    本申请涉及一种一锅法合成羟基苯乙烯类化合物的方法,所述方法包括在常压或减压条件下,且在适于第一有机溶剂回流的第一温度下使羟基取代的苯甲醛、丙二酸或者丙二酸衍生物、碱性催化剂和阻聚剂在第一有机溶剂中反应第一预定时间,得到第一反应混合物;随后将反应体系的温度升高到第二温度,反应第二预定时间,得到第二反应混合物,将第二反应混合物蒸馏除去溶剂,得到羟基苯乙烯类化合物。本申请的有益效果在于合成羟基苯乙烯类化合物的反应温度温和,最终产物产率高。
  • Photoresist composition
    申请人:Kamabuchi Akira
    公开号:US10377692B2
    公开(公告)日:2019-08-13
    A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.
    一种光阻组合物,包括以下成分:由含有酸敏感基团的化合物衍生的结构单元构成的树脂,该树脂在碱性水溶液中不溶或溶解性差,但在酸的作用下变得可溶于碱性水溶液;酸发生剂;以及由下式(I')表示的化合物:其中,R51、R52、R53和R54各自独立地表示C1-C8烷基;A11表示一个C3-C36的二价饱和环烃基,该基团可以含有一个或多个杂原子,并且可以具有一个或多个取代基,或者表示一个C6-C20的二价芳香族烃基,该基团可以含有一个或多个杂原子,并且可以具有一个或多个取代基。
  • NOVEL SIRTUIN ACTIVATING COMPOUNDS AND PROCESSES FOR MAKING THE SAME
    申请人:Andrus Merritt B.
    公开号:US20100185006A1
    公开(公告)日:2010-07-22
    The present invention includes methods for preparing resveratrol, resveratrol esters and substituted and unsubstituted stilbenes of the formula given below; where each Y is —O or halogen, each Z is —O or halogen, each n and each m is independently the value of 0, 1, 2, 3, 4 or 5, each A and each B is independently selected from P n , R or absent, each V and each W is independently selected from P n , straight or branched alkyl of from 2 to 6 carbon atoms and cycloalkyl of from 3 to 8 carbon atoms, alkoxy, phenyl, benzyl or halogen, R is independently selected from the group comprising alkyl with at least one carbon atom, aryl and aralkyl, P n is an alcohol protecting group and diastereoisomers of the foregoing. The compounds are made from a multi-step process including a N-heterocyclic carbene-type ligand coupling in the presence of a base with benzyol halide and styrene coupling partners. These compounds show increased stability for use in the food, cosmetic and pharmaceutical industries.
    本发明涉及制备白藜芦醇、白藜芦醇酯和给出下列式子的取代和未取代的苯乙烯的方法;其中每个Y是—O或卤素,每个Z是—O或卤素,每个n和每个m是独立地取值为0、1、2、3、4或5,每个A和每个B是独立地从Pn、R或缺失中选择,每个V和每个W是独立地从Pn、2到6个碳原子的直链或支链烷基和3到8个碳原子的环烷基、烷氧基、苯基、苄基或卤素中选择,R是独立地从包括至少一个碳原子的烷基、芳基和芳基烷基的群体中选择,Pn是醇保护基和上述化合物的对映异构体。这些化合物是通过多步反应制备的,包括在碱存在下与苯乙烯偶联反应的N-杂环卡宾型配体偶联反应。这些化合物表现出增强的稳定性,可用于食品、化妆品和制药工业中。
  • PHOTOSENSITIVE COMPOSITION, CURED FILM AND PRODUCTION PROCESS THEREOF, AND ELECTRONIC PART
    申请人:JSR CORPORATION
    公开号:US20140234777A1
    公开(公告)日:2014-08-21
    It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH 2 OR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).
    本发明的目的是提高树脂组合物和光敏组合物的可固化性,适用于形成电子部件的表面保护膜和层间绝缘膜等,同时在组合物用于在基板上形成固化膜时减少基板中剩余的内部应力。光敏组合物包括具有酚羟基的树脂(A),至少具有两个噁唑烷基的交联剂(B1),至少具有两个由—CH2OR(其中R是氢原子,具有1至10个碳原子的烷基或乙酰基)表示的基团的交联剂(B2)和光敏酸发生剂(C)。
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