METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER
申请人:Asakawa Koji
公开号:US20070138139A1
公开(公告)日:2007-06-21
Disclosed is an acid etching resistance material comprising a compound having a repeating unit represented by the following general formula (1):
(in the general formula (1), R
1
is a hydrogen atom or methyl group; R
3
is a cyclic group selected from an alicyclic group and an aromatic group; R
4
is a polar group; R
2
is a group represented by the following general formula (2); and j is 0 or 1):
(in the general formula (2), R
5
is a hydrogen atom or methyl group).
US7445881B2
申请人:——
公开号:US7445881B2
公开(公告)日:2008-11-04
US7714316B2
申请人:——
公开号:US7714316B2
公开(公告)日:2010-05-11
Gold Catalysis: In Situ EXAFS Study of Homogeneous Oxidative Esterification
作者:A. Stephen K. Hashmi、Christian Lothschütz、Martin Ackermann、René Doepp、Sankaran Anantharaman、Benjamin Marchetti、Helmut Bertagnolli、Frank Rominger
DOI:10.1002/chem.200903450
日期:2010.7.19
Gold complexes were prepared and investigated as catalysts for the oxidativeesterification of aldehydes. Stabilisation by pyridine ligands gave good conversions and the in situ extended X‐ray absorption fine structure (EXAFS) study of the reactions indicated that the reaction mixtures contained only mononuclear gold species. Thus, this is the first proof for a homogeneousgold‐catalysed oxidation