申请人:Merck Patent Gesellschaft mit beschraenkter Haftung
公开号:US05149853A1
公开(公告)日:1992-09-22
In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
在通过气相沉积生产薄膜和外延层的过程中,采用分子内稳定的有机金属化合物作为金属源。