申请人:ICI PHARMA
公开号:EP0113965A2
公开(公告)日:1984-07-25
A process for the manufacture of a cephalosporin derivative of the formula I:
in which X is sulphur, oxygen or sulphinyl; R1 is any one of the C-3 substituents from antibacterially-active cephalosporins known in the art; R2 is hydrogen or 1-6C alkyl; R3 is hydrogen or 1-6C alkyl; and the pharmaceutically-acceptable acid-addition and base-addition salts thereof, characterised by cyclisation of a compound of the formula II:
or a derivative thereof in which the carbonyl group is masked, or an acid-addition salt thereof, in which R4 and R5 individually have one of the values for R2 and R3, R6 is a nitrogen-protecting group and R7 is hydrogen or any one of the cephalosporin 3-carboxylic acid protecting groups known in the art;
whereafter when the product from the cyclisation re- atains the protecting group R7 (when R7 is other than hydrogen) the protecting group R7 is replaced by hydrogen by conventional means;
and whereafter when the compound of the formula I is obtained in the form of the free base or salt, and a pharmaceutically-acceptable salt or free base respectively is required, any necessary conversion between free base and salt is carried out by conventional means.
一种制造式 I 的头孢菌素衍生物的工艺:
其中 X 为硫、氧或亚砜基;R1 为本领域已知的具有抗菌活性的头孢菌素的 C-3 取代基中的任一种;R2 为氢或 1-6C 烷基;R3 为氢或 1-6C 烷基;以及其药学上可接受的酸加成盐和碱加成盐,其特征在于将式 II.的化合物或其衍生物(其中羰基被掩蔽)或其酸加成盐环化:
或其衍生物,其中的羰基被掩蔽,或其酸加成盐,其中 R4 和 R5 分别具有 R2 和 R3 的值之一,R6 是氮保护基团,R7 是氢或本领域已知的头孢菌素 3-羧酸保护基团中的任一种;
此后,当环化产物重新含有保护基团 R7 时(当 R7 不是氢时),保护基团 R7 通过常规方法被氢取代;
此后,当式 I 的化合物以游离碱或盐的形式获得,并需要分别获得药学上可接受的盐或游离碱时,通过常规方法在游离碱和盐之间进行必要的转换。