N-cyclohexyl-2-naphthalenesulfonamide

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: N-cyclohexyl-2-naphthalenesulfonamide
• 英文别名: N~2~-Cyclohexyl-2-naphthalenesulfonamide；N-cyclohexylnaphthalene-2-sulfonamide
• 化学式: C₁₆H₁₉NO₂S
• mdl: MFCD01985655
• 分子量: 289.398
• InChiKey: FOOWHTMEMFZITA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  54.6
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  环己胺 、 2-萘硫醇 在 双氧水 、 氯化锆(IV) 、 吡啶 作用下， 以 乙腈 为溶剂， 反应 0.03h， 以96%的产率得到N-cyclohexyl-2-naphthalenesulfonamide
  参考文献：
  名称：

  Direct conversion of thiols and disulfides into sulfonamides

  摘要：

  The H(2)O(2)-ZrCl(4) reagent system is used as a new and efficient reagent for the conversion of thiols and disulfides into sulfonamides. The protocol offers several advantages such as excellent yields of products and extremely fast reactions at room temperature. The reagent system is very easy to handle and is environmentally safe and economical. (C) 2010 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.tetlet.2010.07.056

文献信息

• Preparation of acid-labile resins with halide linkers and their utility in solid phase organic synthesis
  作者：Khehyong Ngu、Dinesh V. Patel

  DOI：10.1016/s0040-4039(96)02502-6

  日期：1997.2

  preparation of acid-labile resins with displaceable halide linkers (3 and 4, X = BrandI) is described. These resins can be used in combinatorial organic synthesis of numerous drug-scaffold libraries. Their synthetic utility is exemplified by high yielding N-alkylations with structurally and electronically diverse sets of aliphatic and aromatic amines. Amongst the various resins modified and evaluated in

  描述了一种温和而有效的制备具有可置换卤化物连接基（3和4，X = Br和I）的酸不稳定树脂的方法。这些树脂可用于多种药物支架库的组合有机合成。它们的合成效用以高产率的N-烷基化与脂肪族和芳香族胺在结构和电子方面的多样化设置为例。在本研究中改性和评估的各种树脂中，Wang树脂衍生的溴代树脂（3，X = Br）提供了关于负载，稳定性和化学反应性的最佳实用选择。
• LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME
  申请人：Son Jeong-man

  公开号：US20100080973A1

  公开（公告）日：2010-04-01

  The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).

  本发明涉及一种用于制备具有高强度、耐磨性和优异的阻隔性能的保护膜的组合物，通过低温硬化制备的保护膜，包括该组合物的基材以及包括该组合物的部件或器件。该组合物包括有机硅聚合物a)、光酸生成剂b)和有机溶剂c)。
• METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN
  申请人：Shimizu Daisuke

  公开号：US20100233635A1

  公开（公告）日：2010-09-16

  A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.

  一种形成图案的方法包括：（1）在基板上形成一个底层薄膜，该底层薄膜包含（A）一种辐射敏感的酸发生剂，能够在辐射射线的作用下产生酸，或者（B）一种辐射敏感的碱发生剂，能够在辐射射线的作用下产生碱；（2）通过一个预定图案的掩模，用辐射射线照射底层薄膜，以获得已通过预定图案选择性暴露的底层薄膜部分；（3）在底层薄膜上形成一层有机薄膜，以实现暴露的底层薄膜部分与形成在暴露的底层薄膜部分上的有机薄膜的化学键合；（4）去除除暴露的底层薄膜部分外的底层薄膜区域上形成的有机薄膜。
• Radiation sensitive compositions and processes
  申请人：SHIPLEY COMPANY INC.

  公开号：EP0555749A1

  公开（公告）日：1993-08-18

  A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

  一种辐射敏感组合物、使用所述组合物的工艺以及涂有所述组合物的基底。可感光成像组合物包括感光基发生化合物、树脂粘合剂和在碱存在下能够交联的材料。在优选方面，本发明提供了一种阴性作用的水性显影型可感光成像组合物，该组合物包含光致发光基化合物、树脂粘合剂（最好是酚醛聚合物）、交联剂（包含一个或多个可发生碱引发交联的活性基团）和固化剂。
• Radiation-sensitive compositions
  申请人：SHIPLEY COMPANY INC.

  公开号：EP0565858A1

  公开（公告）日：1993-10-20

  Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions off the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.

  辐射敏感组合物、使用组合物的工艺以及包含组合物的制造品。本发明的光成像组合物包含辐射敏感成分、树脂粘合剂和聚丁二烯，聚丁二烯包含一个或多个内部环氧基团。在优选方面，本发明的组合物还包括一种交联剂，如三聚氰胺或环氧化物，或它们的混合物。