申请人:Kowa Company, Ltd.
公开号:US07393866B2
公开(公告)日:2008-07-01
The present invention provides to a novel compound having an ACAT inhibiting activity.
The present invention relates to compounds represented by formula (I)
wherein represents an optionally substituted divalent residue such as benzene, pyridine, cyclohexane or naphthalene, or a group,
Het represents a 5- to 8-membered, substituted or unsubstituted heterocyclic group containing at least one heteroatom selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom, such as a monocyclic group, a polycyclic group or a group of a fused ring,
X represents —NH—, an oxygen atom or a sulfur atom,
Y represents —NR4—, an oxygen atom, a sulfur atom, a sulfoxide or a sulfone,
Z represents a single bond or —NR5—,
R4 represents a hydrogen atom, a lower alkyl group, an aryl group or an optionally substituted silyl lower alkyl group,
R5 represents a hydrogen atom, a lower alkyl group, an aryl group or an optionally substituted silyl lower alkyl group, and
n is an integer of from 1 to 15,
or salts or solvates thereof, and a pharmaceutical composition containing at least one of these compounds.
本发明提供了一种具有ACAT抑制活性的新型化合物。本发明涉及由式(I)表示的化合物,其中表示可选取代的二价残基,例如苯、吡啶、环己烷或萘,或者是一个杂环基团,该杂环基团是一个含有至少一个氮原子、一个氧原子和一个硫原子的杂原子的5-至8-成员取代或未取代的杂环基团,例如单环基团、多环基团或融合环的基团,X表示—NH—、一个氧原子或一个硫原子,Y表示—NR4—、一个氧原子、一个硫原子、一个亚砜或一个磺酰基,Z表示一个单键或—NR5—,R4表示氢原子、低碳基、芳基或可选取代的硅基低碳基,R5表示氢原子、低碳基、芳基或可选取代的硅基低碳基,n为1至15的整数,或其盐或溶剂合物,以及包含这些化合物中至少一种的制药组合物。