RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING COPOLYMER THAT HAS TRIAZINE RING AND SULFUR ATOM IN MAIN CHAIN
申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20170038687A1
公开(公告)日:2017-02-09
A resist underlayer film-forming composition containing a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2), a cross-linkable compound, a cross-linking catalyst, and a solvent.
wherein A is a divalent organic group containing a triazine ring, X
1
is an —S— group or an —O— group, Q is a linear, branched, or cyclic hydrocarbon group having a carbon atom number of 1 to 15, the hydrocarbon group may have at least one sulfur atom or oxygen atom in a main chain and at least one hydroxy group as a substituent, n is 0 or 1, R
1
and R
2
are each independently a C
1-3
alkylene group or a single bond, Z is a divalent group having at least one sulfur atom or oxygen atom, and when X
1
is an —O— group, Z is a divalent group having at least one sulfur atom.