申请人:Rohm and Haas Company
公开号:US04131736A1
公开(公告)日:1978-12-26
The present invention is concerned with novel monomers containing sulfonic acid groups or salts thereof and polymers thereof which are useful for many purposes, such as antistatic agents for textiles and other shaped articles formed of hydrophilic materials. They are useful for making copolymers that are particularly valuable in coating compositions, especially in the form of aqueous latices or organic solvent solutions thereof. Examples of the monomers are of the formula ##STR1## wherein R is hydrogen or lower (C.sub.1 -C.sub.4)alkyl, such as methyl, A is an alkylene group having 2 to 10 carbon atoms, at least 2 of which extend in one chain between the oxygen atoms, and X is an aromatic nucleus or an alkyl group, substituted by a sulfonic acid group and optionally one or more groups selected from sulfonic acid, carboxylic acid, and lower alkyl, such as methyl, ethyl, propyl, or butyl.
本发明涉及含有磺酸基团或其盐的新型单体及其聚合物,这些单体对许多用途都很有用,例如用作纺织品和由亲水性材料制成的其他成型制品的抗静电剂。它们适用于制备特别有价值的共聚物,尤其是在水性乳胶或有机溶剂溶液形式下的涂料组合物。单体的示例为式中的单体,其中R为氢或较低的(C.sub.1-C.sub.4)烷基,例如甲基,A为具有2至10个碳原子的烷基基团,其中至少有2个碳原子在氧原子之间延伸成一条链,X为芳香核或烷基基团,被磺酸基团取代,且可选地选择自磺酸基、羧酸基和较低烷基(例如甲基、乙基、丙基或丁基)中的一个或多个基团。