[EN] RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND [FR] COMPOSITION DE RÉSERVE, PROCÉDÉ DE FORMATION DE MOTIF DE RÉSERVE, COMPOSÉ ET COMPOSÉ POLYMÈRE [JA] レジスト組成物、レジストパターン形成方法、化合物、及び高分子化合物
Molecules having pesticidal utility, and intermediates, compositions, and processes, related thereto
申请人:Dow AgroSciences LLC
公开号:US20180279612A1
公开(公告)日:2018-10-04
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions containing such molecules, and processes of using such pesticidal compositions against such pests. These pesticidal compositions may be used, for example, as acaricides, insecticides, miticides, molluscicides, and nematicides. This document discloses molecules having the following formula (“Formula One”).
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:Ichikawa Koji
公开号:US20110014566A1
公开(公告)日:2011-01-20
A salt represented by the formula (I-Pa):
wherein X
pa
represents a single bond or a C1-C4 alkylene group,
R
pa
represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—,
Y
pa
represents a polymerizable group, and
Z
pa+
represents an organic cation.
MOLECULES HAVING PESTICIDAL UTILITY, AND INTERMEDIATES, COMPOSITIONS, AND PROCESSES, RELATED THERETO
申请人:Dow AgroSciences LLC
公开号:US20170208803A1
公开(公告)日:2017-07-27
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, compositions containing such molecules, and processes of using such molecules and compositions against such pests. These molecules and compositions may be used, for example, as acaricides, insecticides, miticides, molluscicides, and nematicides. This document discloses molecules having the following formula (“Formula One”).
Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
申请人:ISONO Yoshimi
公开号:US20120226070A1
公开(公告)日:2012-09-06
A fluorine-containing unsaturated carboxylic acid represented by formula (1),
wherein R
1
represents a polymerizable double-bond containing group, R
3
represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2),
wherein R
3
and W are defined as above, each of R
4
, R
5
and R
6
independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R
4
, R
5
and R
6
may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.