申请人:Fuji Photo Film Co., Ltd.
公开号:US04939064A1
公开(公告)日:1990-07-03
A light-sensitive material comprises a support and a light-sensitive layer containing silver halide, a reducing agent, an ethylenic unsaturated polymerizable compound and a base precursor in the form of a salt of an organic base with a carboxylic acid. The silver halide, reducing agent, polymerizable compound and base precursor are contained in microcapsules which are dispersed in the light-sensitive layer. The organic base of the base precursor is a diacidic to tetraacidic base which is composed of two to four amidine moieties and at least one linking group for the amidine moieties. The linking group is a residue of a hydrocarbon or a heterocyclic ring. The amidine moiety corresponds to an atomic group formed by removing one or two hydrogen atoms from an amidine having the following formula (I): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 independently is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, a cycloalkyl group, an aralkyl group, an aryl group or a heterocyclic group, and any two of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 may be combined together to form a five-membered or six-membered heterocyclic ring consisting of nitrogen and carbon atoms.
一种光敏材料,包括支撑体和含有卤化银、还原剂、乙烯基不饱和聚合物化合物和碱前体的光敏层,所述碱前体为有机碱与羧酸的盐形式。卤化银、还原剂、聚合物化合物和碱前体被包含在微胶囊中,并分散在光敏层中。碱前体的有机碱是由二酸到四酸的碱组成,其中包括两到四个脲基和至少一个脲基的连接基。连接基是碳氢化合物或杂环环的残基。脲基对应于通过从具有以下式(I)的脲中去除一个或两个氢原子形成的原子基团:其中,R1、R2、R3和R4各自独立地是氢、烷基、烯基、炔基、环烷基、芳基烷基、芳基或杂环基,且R1、R2、R3和R4中的任意两个可以结合形成由氮和碳原子组成的五元环或六元环的杂环环。