1,8-二乙氧基萘 | 104422-23-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 中文名称: 1,8-二乙氧基萘
• 英文名称: 1,8-Diethoxynaphthalene
• CAS: 104422-23-3
• 化学式: C₁₄H₁₆O₂
• 分子量: 216.28
• InChiKey: SKYTZUNCKOTOOR-UHFFFAOYSA-N

物化性质

• 沸点：
  339.8±15.0 °C(Predicted)
• 密度：
  1.057±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1,8-二羟基萘 、 碘乙烷 在 四丁基溴化铵 sodium hydroxide 作用下， 以 二氯甲烷 为溶剂， 反应 45.0h， 以51%的产率得到1,8-二乙氧基萘
  参考文献：
  名称：

  Intramolecular hydrogen bonding enhances the rate of nucleophilic cleavage in alkyl aryl ethers

  摘要：

  DOI：

  10.1021/jo00372a036

文献信息

• Process for preparation of polyhydric alcohols
  申请人：——

  公开号：US20020157939A1

  公开（公告）日：2002-10-31

  A process for preparing a polyhydric alcohol according to the invention comprises subjecting a polyhydric alcohol compound having protected hydroxy group(s) to microwave irradiation in the presence of basic compound(s) or acid(s) having an acid dissociation exponent (pKa) of −8 to 3 at 25° C. to remove the protecting groups of the hydroxy group of the polyhydric alcohol compound. The invention can provide an industrially advantageous process for preparing polyhydric alcohols by readily removing protecting group(s) from protected hydroxy group(s) of polyhydric alcohol compounds.

  根据该发明，制备多羟基醇的方法包括将具有受保护羟基的多羟基醇化合物置于存在具有25°C下酸解离指数（pKa）为-8至3的碱性化合物或酸性化合物的微波辐射中，以去除多羟基醇化合物的羟基的保护基。该发明可以通过轻松去除多羟基醇化合物中受保护羟基的保护基，提供一个工业上有利的制备多羟基醇的方法。
• MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20220214617A1

  公开（公告）日：2022-07-07

  A material for forming organic film contains (A) compound shown by general formula (1) and/or polymer having repeating unit shown by general formula (4), and (B) organic solvent. In formula (1), AR1, AR2, AR3, AR4, AR5, and AR6 each represent benzene ring or naphthalene ring; R1 represents any group shown in following formula (2); “n” represents integer of 1 or 2; and W represents divalent organic group having 2-50 carbon atoms. In formula (4), AR1, AR2, AR3, AR4, AR5, AR6, R1, “n”, and W are as defined above; and R2 and R3 each represent hydrogen atom or organic group having 1-20 carbon atoms, and optionally bond to each other within molecule to form cyclic organic group. An object provides a material for forming organic film to enable high etching resistance and excellent twisting resistance without impairing resin-derived carbon content; and compound and polymer suitable for material for forming organic film.

  一种用于形成有机薄膜的材料包含(A)通式(1)所示的化合物和/或具有通式(4)所示的重复单元的聚合物，以及(B)有机溶剂。在公式(1)中，AR1、AR2、AR3、AR4、AR5和AR6各代表苯环或萘环；R1代表以下公式(2)中显示的任何基团；“n”表示1或2的整数；W代表具有2-50个碳原子的二价有机基团。在公式(4)中，AR1、AR2、AR3、AR4、AR5、AR6、R1、“n”和W如上所定义；R2和R3各代表氢原子或具有1-20个碳原子的有机基团，并且可选择在分子内彼此结合形成环状有机基团。本发明提供了一种用于形成有机薄膜的材料，以实现高蚀刻抗性和优异的扭曲抗性，而不损害树脂衍生的碳含量；以及适用于形成有机薄膜的化合物和聚合物。
• Analgesic carboxylic acid amide derivatives
  申请人：Sankyo Company Limited

  公开号：EP0356247A1

  公开（公告）日：1990-02-28

  Analgesic compounds are of the general formula (I): in which, R¹ and R² each represents hydrogen or C₁-C₆ alkyl, or R¹ and R² together with the nitrogen atom to which they are attached form a heterocycle; E represents methylene, sulphur, oxygen or imino group optionally substituted with C₁-C₆ alkyl or aralkyl; ring A is aryl or heteroaryl ring, optionally substituted; R³ is hydrogen or C₁-C₆ alkyl and R⁴ is hydrogen or R³ and R⁴ together represent a group of formula (IV): -(CRaRa)m-C(=Y)-      (IV) (wherein Ra and Ra is C₁-C₆ alkyl or hydrogen, up to a maximum of 3 alkyl groups, m is 1, 2, or 3, and Y is two hydrogens or oxygen); provided that when E represents a methylene group, then R³ is a C₁-C₆ alkyl group or R³ and R⁴ together represent a group of the formula (IV).

  镇痛化合物的通式为(I)： 其中，R¹ 和 R² 各自代表氢或 C₁-C₆烷基，或 R¹ 和 R² 与它们所连接的氮原子一起形成杂环；E 代表亚甲基、硫、氧或亚氨基，可选择被 C₁-C₆ 烷基或芳烷基取代；环 A 是任选被取代的芳基或杂芳基环；R³ 是氢或 C₁-C₆ 烷基，R⁴ 是氢或 R³ 和 R⁴ 共同代表式 (IV) 的基团： -(CRaRa)m-C(=Y)-(IV) (其中 Ra 和 Ra 是 C₁-C₆ 烷基或氢，最多 3 个烷基，m 是 1、2 或 3，Y 是两个氢或氧)；条件是当 E 代表亚甲基时，R³ 是 C₁-C₆ 烷基或 R³ 和 R⁴ 共同代表式(IV)的基团。
• PROCESS FOR THE PREPARATION OF POLYHYDRIC ALCOHOLS
  申请人：National Institute of Advanced Industrial Science and Technology

  公开号：EP1298115A1

  公开（公告）日：2003-04-02

  A process for preparing a polyhydric alcohol according to the invention comprises subjecting a polyhydric alcohol compound having protected hydroxy group(s) to microwave irradiation in the presence of basic compound(s) or acid(s) having an acid dissociation exponent (pKa) of -8 to 3 at 25°C to remove the protecting groups of the hydroxy group of the polyhydric alcohol compound. The invention can provide an industrially advantageous process for preparing polyhydric alcohols by readily removing protecting group(s) from protected hydroxy group(s) of polyhydric alcohol compounds.

  根据本发明制备多元醇的工艺包括：在碱性化合物或酸解离指数（pKa）为-8 至 3 的酸存在下，在 25°C 的温度下，对具有受保护羟基的多元醇化合物进行微波辐照，以去除多元醇化合物羟基的保护基团。本发明可提供一种具有工业优势的制备多羟基醇的工艺，该工艺可轻松去除多羟基醇化合物受保护羟基上的保护基团。
• MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP4020083A1

  公开（公告）日：2022-06-29

  A material for forming an organic film contains (A) a polymer having a repeating unit shown by the following general formula (1), and (B) an organic solvent. In the general formula (1), AR1, AR2, AR3, and AR4 each represent a benzene ring or a naphthalene ring; W1 represents a tetravalent organic group having 6 to 70 carbon atoms and at least one or more aromatic rings; and W2 represents a divalent organic group having 1 to 50 carbon atoms. An object of the present invention is to provide: a material for forming an organic film to enable high etching resistance and excellent twisting resistance without impairing the resin-derived carbon content; a patterning process using this material; and a polymer suitable for such a material for forming an organic film.

  一种用于形成有机薄膜的材料包含（A）具有以下通式（1）所示重复单元的聚合物和（B）有机溶剂。在通式（1）中，AR1、AR2、AR3 和 AR4 分别代表苯环或萘环；W1 代表具有 6 至 70 个碳原子和至少一个或多个芳香环的四价有机基团；W2 代表具有 1 至 50 个碳原子的二价有机基团。本发明的目的是提供：一种用于形成有机薄膜的材料，在不影响树脂衍生碳含量的情况下实现高抗蚀刻性和优异的抗扭曲性；一种使用这种材料的图案化工艺；以及一种适用于这种用于形成有机薄膜的材料的聚合物。