2,6-二(羟甲基)-3,4-二甲基苯酚 | 67730-48-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 中文名称: 2,6-二(羟甲基)-3,4-二甲基苯酚
• 英文名称: 2-Hydroxy-4.5-dimethyl-1.3-bis-hydroxymethyl-benzol
• 英文别名: 2,6-Bis-hydroxymethyl-3,4-dimethyl-phenol；2,6-bis(hydroxymethyl)-3,4-dimethylphenol
• CAS: 67730-48-7
• 化学式: C₁₀H₁₄O₃
• 分子量: 182.219
• InChiKey: BHPFXDABRSZTIL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2,6-二(羟甲基)-3,4-二甲基苯酚 在 盐酸 作用下， 生成 4-Hydroxy-1,2-dimethyl-3,5-bis-(6-hydroxy-3,4-dimethyl-benzyl)-benzol
  参考文献：
  名称：

  Spaltungen mittels Diazoniumverbindungen

  摘要：

  DOI：

  10.1007/bf00906474
• 作为产物：
  描述：

  3,4-二甲基苯酚 在 sodium hydroxide 、 聚合甲醛 、 溶剂黄146 作用下， 以 水 为溶剂， 生成 2,6-二(羟甲基)-3,4-二甲基苯酚
  参考文献：
  名称：

  Positive resist composition and photosensitizers

  摘要：

  一种正相光刻胶组合物，包括以下式（I）所代表的酚化合物的喹喔二唑磺酸酯作为光敏剂：其中Q.sup.1、Q.sup.2、Q.sup.3、Q.sup.4、Q.sup.5、Q.sup.6、Q.sup.7、Q.sup.8、Q.sup.9和Q.sup.10独立地代表氢、具有1-6个碳原子的烷基或苯基，或Q.sup.1和Q.sup.2、Q.sup.3和Q.sup.4、Q.sup.5和Q.sup.6、Q.sup.7和Q.sup.8、或Q.sup.9和Q.sup.10可以与它们连接的碳原子一起形成具有6个或更少碳原子的环烷烃环，R.sup.1、R.sup.2、R.sup.3、R.sup.4、R.sup.5、R.sup.6、R.sup.7、R.sup.8、R.sup.9、R.sup.10、R.sup.11、R.sup.12、R.sup.13、R.sup.14、R.sup.15和R.sup.16独立地代表氢、羟基、具有1-6个碳原子的烷基或苯基；m和n独立地代表0或1的数字；以及一种碱溶性树脂；和式（I）的一种酚化合物的喹喔二唑磺酸酯。

  公开号：

  US05866724A1

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Photoresist with novel photoactive compound
  申请人：Shipley Company, L.L.C.

  公开号：US06051358A1

  公开（公告）日：2000-04-18

  An unsymetrical photoactive compound having the formula ##STR1## where Z is hydrogen, a hydrocarbon having from 1 to 8 carbon atoms, or halogen; D is hydrogen or diazo-oxo-naphthalene-sulfonyl; n is equal to 1 to 4; R.sub.1, R.sub.5 and R.sub.6 are independently a hydrocarbon or halogen; R.sub.2 is the same as R.sub.1 or hydrogen; each R.sub.3 is the same as R.sub.2, hydroxyl or --OD; and each R.sub.4 is the same as R.sub.2 or another substituent provided that at least one R.sub.2, or one or both R.sub.4 is other than hydrogen, at least 2 Ds are diazo-oxo-sulfonyl group and at least 50 mole percent of the mixture conforms to the formula where n equals 1. The compounds of the invention are suitable for formation of storage stable photoresist compositions.

  一种非对称光敏化合物，其化学式为##STR1##其中，Z为氢、具有1至8个碳原子的碳氢化合物或卤素；D为氢或重氮氧萘磺酰基；n等于1至4；R.sub.1、R.sub.5和R.sub.6独立地为碳氢化合物或卤素；R.sub.2与R.sub.1相同或为氢；每个R.sub.3与R.sub.2相同、为羟基或--OD；每个R.sub.4与R.sub.2相同或为另一取代基，但至少有一个R.sub.2或一个或两个R.sub.4不是氢，至少2个D为重氮氧磺酰基，且至少50摩尔%的混合物符合式子，其中n等于1。该发明的化合物适用于形成储存稳定的光刻胶组合物。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• Novel polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2228400A1

  公开（公告）日：2010-09-15

  A polyimide silicone having in the molecule a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group is provided. The polyimide silicone comprises the unit represented by the formula (1): wherein X is a tetravalent group at least a part of which is a tetravalent organic group represented by the formula (2): wherein R1 is a monovalent hydrocarbon group, R2 is a trivalent group, and n is an integer of 1 to 120 on average; and Y is a divalent organic group at least a part of which is a divalent organic group having a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group represented by the formula (3): wherein R3 and R4 are a hydrogen atom or an alkyl group, and R5 is an alkyl group, an aryl group, or an aralkyl group. R3 and R4, R3 and R5, or R4 and R5 may be bonded to each other to form a ring together with the carbon atom or the carbon atom and the oxygen atom to which they are bonded with the proviso that the R3, R4, and R5 are independently an alkylene group.

  本发明提供了一种聚酰亚胺硅氧烷，其分子中的酚羟基部分或全部氢原子被酸性基团取代。该聚酰亚胺有机硅由式（1）所代表的单元组成： 其中 X 是四价基团，至少其中一部分是由式（2）表示的四价有机基团： 其中 R1 是一价烃基，R2 是三价基，n 是平均为 1 至 120 的整数；Y 是二价有机基团，其中至少有一部分是具有酚羟基的二价有机基团，该酚羟基中的部分或全部氢原子被式（3）所代表的易酸基团取代： 其中 R3 和 R4 是氢原子或烷基，R5 是烷基、芳基或芳烷基。R3 和 R4、R3 和 R5 或 R4 和 R5 可以相互键合，与碳原子或碳原子和氧原子一起形成一个环，但 R3、R4 和 R5 必须是独立的亚烷基。
• �ber Kondensationsprodukte des 3,4-Dimethylphenols mit Formaldehyd
  作者：G. Zigeuner、E. Ziegler

  DOI：10.1007/bf00903033

  日期：——