Provided herein are compositions and methods for polishing surfaces comprising cobalt and optionally a low-K material, e.g., in semiconductor device fabrication. Embodiments include a slurry for chemical mechanical polishing a surface comprising cobalt and low-K materials, such as Black Diamond (BD) or SiN, comprising a complexor, an oxidizer, an abrasive, a Co corrosion inhibitor and an ILD suppressor.
本文提供了用于抛光由
钴和可选的低 K 材料组成的表面的组合物和方法,例如在半导体器件制造中。 本发明的实施方案包括一种用于
化学机械抛光由
钴和低 K 材料(如黑钻石 (BD) 或 SiN)组成的表面的浆料,其中包括络合剂、氧化剂、研磨剂、
钴腐蚀
抑制剂和 ILD
抑制剂。