Electrically photosensitive particles for photoelectrophoretic migration imaging processes
申请人:EASTMAN KODAK COMPANY
(a New Jersey corporation)
公开号:EP0000599A1
公开(公告)日:1979-02-07
Electrically photosensitive particles for electrophoretic migration imaging processes.
Electrophotosensitive particles (4) for electrophoretic migration imaging processes comprise a compound having the structure
or
wherein m and n are zero, one or two; L'to L' are hydrogen, alkyl, cyano aralkyl, aryl or heterocyclyl, and in addition, any two of L1, L2 and L3 and any two of L4, L5,L6 and L' may together represent the atoms needed to complete a carbocyclic ring having from 5-10 carbon atoms; A' represents an alkyl, aryl group or a heterocyclic nucleus; A2 represents a basic heterocyclic nucleus; B1 and B2 represent cyano, carboxy, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, acyl, arylcarbonyl, heteroyl, nitro, nitro substituted aryl, sulfonyl, fluorosulfonyl, trifluoromethylsulfonyl, carbamoyl, arylcarbamoyl or alkylcarbamoyl.
The particles (4) can be used in an.electrophoretic migration imaging process which consists in placing them between two electrodes (1) and (5) and submitting them to an activating radiation and an electric field for obtaining an f image on electrodes (1) and (5).
用于电泳迁移成像过程的电光敏颗粒。
用于电泳迁移成像过程的电致发光颗粒(4)由具有以下结构的化合物组成
或
其中m和n为0、1或2;L'至L'为氢、烷基、氰基芳基、芳基或杂环基,此外,L1、L2和L3中的任意两个以及L4、L5、L6和L'中的任意两个可共同代表完成具有5-10个碳原子的碳环所需的原子;A'代表烷基、芳基或杂环核;A2 代表基本杂环核;B1 和 B2 代表氰基、羧基、烷氧羰基、芳氧羰基、烷基磺酰基、酰基、芳基羰基、杂酰基、硝基、硝基取代的芳基、磺酰基、氟磺酰基、三氟甲基磺酰基、氨基甲酰基、芳基氨基甲酰基或烷基氨基甲酰基。
微粒(4)可用于电泳迁移成像过程,该过程包括将微粒(4)置于两个电极(1)和(5)之间,并将其置于活化辐射和电场中,以在电极(1)和(5)上获得 f 图像。