申请人:Hatakeyama Jun
公开号:US20130084529A1
公开(公告)日:2013-04-04
A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1), (2) or (3) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R
1
, R
2
, R
5
, R
6
, R
8
, and R
9
are alkyl, aryl, or alkenyl, R
3
, R
4
, R
7
, R
10
, and R
11
are hydrogen, alkyl, alkoxy, acyloxy, halogen, cyano, nitro, hydroxyl or trifluoromethyl, M is methylene or ethylene, R is a single bond or linking group.