申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:EP0676668A1
公开(公告)日:1995-10-11
A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises;
an o-quinonediazide compound; and
a novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I)
wherein R ₄ to R₆ represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k' represents an integer not smaller than 0 and p represents 1, 2 or 3,
to react with a phenol compound of the formula (II)
wherein R ₇ to R₉ represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R₇ to R₉ is cycloalkyl having 6 or less carbon atoms,
in the presence of an acid catalyst
to obtain a reaction product (1) containing low molecular weight ingredients;
and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.
一种对紫外线、远紫外线等辐射敏感的正抗蚀剂组合物,它包括
邻醌噻嗪化合物;以及
一种酚醛树脂(1),通过添加式(I)的芳香醛获得
其中 R₄ 至 R₆ 代表氢、烷基、环烷基、烷氧基、烯基或芳基,k' 代表不小于 0 的整数,p 代表 1、2 或 3、
与式 (II) 的苯酚化合物反应
其中 R₇ 至 R₉ 代表氢、羟基、烷基、环烷基、烷氧基、烯基或芳基,条件是 R₇ 至 R₉ 中至少有一个是具有 6 个或更少碳原子的环烷基、
在酸催化剂存在下
得到含有低分子量成分的反应产物 (1);
然后,让反应产物(1)与苯酚化合物(1)和甲醛进一步反应。