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2-Cyclopentyl-5-methyl-phenol | 35293-57-3

中文名称
——
中文别名
——
英文名称
2-Cyclopentyl-5-methyl-phenol
英文别名
3-Methyl-6-cyclopentyl-phenol;3-Hydroxy-1-methyl-4-cyclopentyl-benzol;3-Methyl-6-cyclopentylphenol;2-cyclopentyl-5-methylphenol
2-Cyclopentyl-5-methyl-phenol化学式
CAS
35293-57-3
化学式
C12H16O
mdl
——
分子量
176.258
InChiKey
QATQNWVHZQWIEW-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.9
  • 重原子数:
    13
  • 可旋转键数:
    1
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

反应信息

点击查看最新优质反应信息

文献信息

  • PRODUCTION METHOD FOR 4-HYDROXY-2-METHYLBENZOIC ACID
    申请人:HONSHU CHEMICAL INDUSTRY CO., LTD.
    公开号:US20220127216A1
    公开(公告)日:2022-04-28
    An object is to provide a novel production method for 4-hydroxy-2-methylbenzoic acid that is suitable for industrial use. As a solution, a production method for 4-hydroxy-2-methylbenzoic acid that includes performing a step (I) of reacting a compound represented by general formula (1) with carbon dioxide to obtain a compound represented by general formula (2), and then a step (II) of dealkylating the compound represented by general formula (2), is provided.
    本发明旨在提供一种适用于工业生产的4-羟基-2-甲基苯甲酸新型生产方法。解决方案为提供一种4-羟基-2-甲基苯甲酸的生产方法,包括进行步骤(I),将通式(1)表示的化合物与二氧化碳反应以获得通式(2)表示的化合物,然后进行步骤(II),对通式(2)表示的化合物进行脱烷基化。
  • Recording materials and image receiving materials for producing copies
    申请人:AGFA-GEVAERT N.V.
    公开号:US04013473A1
    公开(公告)日:1977-03-22
    Thermographic recording material or image-receiving material for dry copying processes comprising at least one layer and a substantially non-photosensitive reducible silver salt, a reducing agent, and optionally a toning agent or toning mixture, wherein the reducing agent corresponds to the following general formula: ##STR1## wherein: EACH OF R.sup.1, R.sup.3 and R.sup.5 (equal or different) represents hydrogen, a straight-chain or branched alkyl group comprising 1 to 9 carbon atoms, or a cycloalkyl group, with the proviso that R.sup.1 and R.sup.5 do not represent hydrogen simultaneously, R.sup.2 represents a straight-chain or branched alkyl group comprising 1 to 4 carbon atoms, or a cycloalkyl group, R.sup.4 represents hydrogen, or a straight-chain or branched alkyl group comprising 1 to 4 carbon atoms, or a cycloalkyl group, And wherein each of R.sup.1 and R.sup.2 together, R.sup.2 and R.sup.3 together or R.sup.4 and R.sup.5 together optionally represent a straight-chain or branched alkylene group for completing a 6-membered ring; provided that that R.sup.1, R.sup.5 or R.sup.3 does not represent t-butyl if the respective adjacent substituent(s) represent(s) a straight-chain or branched alkyl group.
    干法复印过程的热成像记录材料或图像接收材料,包括至少一层和一个基本上非光敏的可还原银盐、还原剂和可选的定色剂或定色混合物,其中还原剂对应于以下通式:##STR1## 其中:R.sup.1、R.sup.3和R.sup.5(相同或不同)中的每一个表示氢、包含1到9个碳原子的直链或支链烷基或环烷基,但R.sup.1和R.sup.5不能同时表示氢,R.sup.2表示包含1到4个碳原子的直链或支链烷基或环烷基,R.sup.4表示氢或包含1到4个碳原子的直链或支链烷基或环烷基,其中R.sup.1和R.sup.2一起、R.sup.2和R.sup.3一起或R.sup.4和R.sup.5一起可选地表示直链或支链亚烷基以完成一个6元环。但如果相应的相邻取代基表示直链或支链烷基,则R.sup.1、R.sup.5或R.sup.3不表示叔丁基。
  • Positive resist composition
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:EP0676668A1
    公开(公告)日:1995-10-11
    A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises;    an o-quinonediazide compound; and    a novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I) wherein R ₄ to R₆ represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k' represents an integer not smaller than 0 and p represents 1, 2 or 3, to react with a phenol compound of the formula (II) wherein R ₇ to R₉ represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R₇ to R₉ is cycloalkyl having 6 or less carbon atoms, in the presence of an acid catalyst to obtain a reaction product (1) containing low molecular weight ingredients; and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.
    一种对紫外线、远紫外线等辐射敏感的正抗蚀剂组合物,它包括 邻醌噻嗪化合物;以及 一种酚醛树脂(1),通过添加式(I)的芳香醛获得 其中 R₄ 至 R₆ 代表氢、烷基、环烷基、烷氧基、烯基或芳基,k' 代表不小于 0 的整数,p 代表 1、2 或 3、 与式 (II) 的苯酚化合物反应 其中 R₇ 至 R₉ 代表氢、羟基、烷基、环烷基、烷氧基、烯基或芳基,条件是 R₇ 至 R₉ 中至少有一个是具有 6 个或更少碳原子的环烷基、 在酸催化剂存在下 得到含有低分子量成分的反应产物 (1); 然后,让反应产物(1)与苯酚化合物(1)和甲醛进一步反应。
  • DE615448
    申请人:——
    公开号:——
    公开(公告)日:——
  • Boettcher,F., Diss. <Berlin 1930> S. 36 Anm.
    作者:Boettcher,F.
    DOI:——
    日期:——
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